Twenty Five Years of Vibrational Kinetics and Negative Ion Production in H2 Plasmas: Modelling Aspects

Journal Article · Wed Apr 06 00:00:00 EDT 2005 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.1908284· OSTI ID:20630822

Capitelli, M ^[1]; De Pascale, O ^[2]; Diomede, P; Gorse, C; Longo, S; Pagano, D ^[1]; Gicquel, A; Hassouni, K ^[3]

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1. Department of Chemistry, University of Bari, Bari (Italy)
2. CSCP-IMIP(CNR), Sezione Terriroriale di Bari, Bari (Italy)
3. LIMHP-CNRS, Univerite Paris Nord, Villetaneuse (France)

Different approaches to study vibrational kinetics coupled to electron one for modeling different kinds of negative ion sources are presented. In particular two types of sources are investigated. The first one is a classical negative ion source in which the plasma is generated by thermoemitted electrons; in the second one, electrons already present in the mixture are accelerated by an RF field to sufficiently high energy to ionize the gas molecules. For the first kind of ion source a new computational scheme is presented to couple heavy particle and electron kinetics. Moreover models developed for an RF inductive discharge and for a parallel plate discharge are described.

• OSTI ID: 20630822
• Journal Information: AIP Conference Proceedings, Vol. 763, Issue 1; Conference: 10. international symposium on production and neutralization of negative ions and beams, Kiev (Ukraine), 14-17 Sep 2004; Other Information: DOI: 10.1063/1.1908284; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

74 ATOMIC AND MOLECULAR PHYSICS
43 PARTICLE ACCELERATORS
ANIONS
ELECTRONS
HIGH-FREQUENCY HEATING
HYDROGEN IONS
ION SOURCES
KINETICS
MIXTURES
MOLECULES
PLASMA
PLASMA SIMULATION
RF SYSTEMS