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Title: Multipole rf switch contact resistance interference, an industrial application of surface analysis

Conference ·
OSTI ID:203503
; ; ;  [1]; ;  [2]
  1. Loral Microwave Narda, Hauppauge, NY (United States)
  2. State Univ. of New York, Stony Brook, NY (United States). Dept. of Materials Science and Engineering

Low contact resistance is vital in communication and switching systems where the insertion loss and the rf/microwave performances of multi-contact switches are pushed to maximum performance. Increased resistance in the switch contact interface is a concern for optimal operation upon first turn-on of the switch. The study of high contact resistance invited the application of the surface analysis tools XPS, SEM and EDX. Environmentally compatible cleaning of the contact parts must retain acceptable compliance with the operational requirements. Hence, the effects of various cleaning agents became a concern. Gold plated beryllium copper contact surfaces function well with the application of a synthetic oil for corrosion protection. The surface contaminants` spectra from a high resistance contact in comparison with control samples demonstrated the utility of these analytical tools. The knowledge of the relative amounts of the contaminants and the circumstances of their arrival assist in revising manufacturing processes to insure long term low resistance operation of the switch.

OSTI ID:
203503
Report Number(s):
CONF-950201-; ISBN 0-87339-317-1; TRN: IM9614%%15
Resource Relation:
Conference: Annual meeting and exhibition of the Minerals, Metals and Materials Society (TMS), Las Vegas, NV (United States), 12-16 Feb 1995; Other Information: PBD: 1995; Related Information: Is Part Of Advances in coatings technologies for corrosion and wear resistance coatings; Srivatsa, A.R. [ed.] [Jet Process Corp., New Haven, CT (United States)]; Clayton, C.R. [ed.] [State Univ. of New York, Stony Brook, NY (United States)]; Hirvonen, J.K. [ed.] [Army Materials Research Agency, Watertown, MA (United States). Materials Technology Lab.]; PB: 364 p.
Country of Publication:
United States
Language:
English