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Title: Plasma sources for electrons and ion beams

Abstract

Plasma devices are commonly used for the production of ion beams. It has been demonstrated that the multicusp generator can produce very low energy ion beams for ion projection lithography applications. The multicusp source has also found important applications in focused ion beam systems. With its high and uniform plasma density, attempts have been made to extract high brightness electron beams from this type of plasma source, making it also useful for electron beam lithography applications. (c) 1999 American Vacuum Society.

Authors:
 [1]
  1. Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720 (United States)
Publication Date:
OSTI Identifier:
20217895
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena
Additional Journal Information:
Journal Volume: 17; Journal Issue: 6; Other Information: PBD: Nov 1999; Journal ID: ISSN 0734-211X
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; PLASMA DENSITY; ELECTRON BEAMS; ION BEAMS; FOCUSING; MICROELECTRONICS; BRIGHTNESS; ION SOURCES; PERMANENT MAGNETS; PLASMA RADIAL PROFILES

Citation Formats

Leung, Ka-Ngo. Plasma sources for electrons and ion beams. United States: N. p., 1999. Web. doi:10.1116/1.591063.
Leung, Ka-Ngo. Plasma sources for electrons and ion beams. United States. https://doi.org/10.1116/1.591063
Leung, Ka-Ngo. 1999. "Plasma sources for electrons and ion beams". United States. https://doi.org/10.1116/1.591063.
@article{osti_20217895,
title = {Plasma sources for electrons and ion beams},
author = {Leung, Ka-Ngo},
abstractNote = {Plasma devices are commonly used for the production of ion beams. It has been demonstrated that the multicusp generator can produce very low energy ion beams for ion projection lithography applications. The multicusp source has also found important applications in focused ion beam systems. With its high and uniform plasma density, attempts have been made to extract high brightness electron beams from this type of plasma source, making it also useful for electron beam lithography applications. (c) 1999 American Vacuum Society.},
doi = {10.1116/1.591063},
url = {https://www.osti.gov/biblio/20217895}, journal = {Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena},
issn = {0734-211X},
number = 6,
volume = 17,
place = {United States},
year = {Mon Nov 01 00:00:00 EST 1999},
month = {Mon Nov 01 00:00:00 EST 1999}
}