Statistical considerations of the overlay error in laser driven point source x-ray lithography

Journal Article · Sat Jul 01 00:00:00 EDT 2000 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena

DOI:https://doi.org/10.1116/1.1303754· OSTI ID:20217190

Tiszauer, Detlev H ^[1]

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1. Laser Science and Technology Dept., Lawrence Livermore National Laboratory, Livermore, California 94550 (United States)

A statistical measure of the point source divergence-induced overlay error over the print field is derived. The assumptions of a wide-sense stationary distribution of gap error and the assumption of a symmetric distribution of overlay sites on the chip field give rise to simple expressions for the overlay error variance. The computations for overlay error are also expressed in the Fourier domain. From this formulation, it is found that these simple results hold for the zero frequency and high frequency limit of gap error in the Fourier domain, even without the assumptions of stationarity. (c) 2000 American Vacuum Society.

• OSTI ID: 20217190
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Vol. 18, Issue 4; Other Information: PBD: Jul 2000; ISSN 0734-211X
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
X-RAY EQUIPMENT
ERRORS
POINT SOURCES
MASKING
MICROELECTRONICS
STATISTICS
LASERS
THEORETICAL DATA