InGaAsN/AlGaAs P-n-p heterojunction bipolar transistor
- Sandia National Laboratories, Albuquerque, New Mexico 87123 (United States)
- Emcore Photovoltaics, Emcore Corporation, Albuquerque, New Mexico 87123 (United States)
- Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States)
We have demonstrated a functional P-n-p heterojunction bipolar transistor (HBT) using InGaAsN. The metalorganic-vapor-phase-epitaxy-grown Al{sub 0.3}Ga{sub 0.7}As/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} HBT takes advantage of the narrower band gap energy (E{sub g}=1.2 eV) of In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01}, which is lattice matched to GaAs. Compared with the Al{sub 0.3}Ga{sub 0.7}As/GaAs material system, the Al{sub 0.3}Ga{sub 0.7}As/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} material system has a larger conduction-band offset, while the valence-band offset remains comparable. This characteristic band alignment is very suitable for P-n-p HBT applications. The device's peak current gain is 23, and it has a turn-on voltage of 0.77 V, which is 0.25 V lower than in a comparable P-n-p Al{sub 0.3}Ga{sub 0.7}As/GaAs HBT. (c) 2000 American Institute of Physics.
- OSTI ID:
- 20216186
- Journal Information:
- Applied Physics Letters, Vol. 76, Issue 19; Other Information: PBD: 8 May 2000; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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