Characteristics of ultraviolet-assisted pulsed-laser-deposited Y{sub 2}O{sub 3} thin films
- Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 (United States)
- Laser Department, National Institute for Laser, Plasma, and Radiation Physics, Bucharest, (Romania)
The properties of thin Y{sub 2}O{sub 3} films grown using an in situ ultraviolet (UV)-assisted pulsed laser deposition (PLD) technique were studied. With respect to Y{sub 2}O{sub 3} films grown by conventional PLD under similar conditions but without UV illumination, the UVPLD-grown films exhibited better structural and optical properties, especially for lower substrate temperatures, from 340 to 400 degree sign C. These layers were highly crystalline and textured along the (111) direction, and their refractive index values were similar to those of reference Y{sub 2}O{sub 3} layers. They also exhibited a better stoichiometry and contained less physisorbed oxygen than the conventional PLD-grown layers. (c) 2000 Materials Research Society.
- OSTI ID:
- 20216018
- Journal Information:
- Journal of Materials Research, Vol. 15, Issue 2; Other Information: PBD: Feb 2000; ISSN 0884-2914
- Country of Publication:
- United States
- Language:
- English
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