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Title: Copper corrosion mechanism in the presence of formic acid vapor for short exposure times

Journal Article · · Journal of the Electrochemical Society
DOI:https://doi.org/10.1149/1.1393303· OSTI ID:20030656

The rate of copper corrosion originated by the action of formic acid vapors at 100% relative humidity was studied. Five formic vapor concentration levels (10, 50, 100, 200, and 300 ppm) were used. A copper corrosion rate of up to 1,300 mg/m{sup 2} d was measured for a period of 21 days using a gravimetric method. The patina layers were characterized using cathodic reduction, X-ray powder diffraction. Fourier transform infrared spectrometry, and scanning electron microscopy techniques. Some of the components identified in the corrosion-product layers were cuprite (Cu{sub 2}O), cupric hydroxide hydrate [Cu(OH){sub 2}{sm_bullet}H{sub 2}O], and copper formate hydrate [Cu(HCOO){sub 2}{sm_bullet}4H{sub 2}O]. The latter was formed by both cupric hydroxide and formic acid-cuprous ion complex mechanisms.

Research Organization:
Centro Nacional de Investigaciones Metalurgicas, Madrid (ES)
OSTI ID:
20030656
Journal Information:
Journal of the Electrochemical Society, Vol. 147, Issue 3; Other Information: PBD: Mar 2000; ISSN 0013-4651
Country of Publication:
United States
Language:
English