Dynamic cyclotron resonance in relativistic microwave devices with linear electron beams
- Moscow State Univ. (Russian Federation)
In the present work the authors analyze theoretically and by numerical simulation dependencies of output radiation versus magnitude of focusing magnetic field when magnetic field magnitude is sufficiently smaller than value corresponding to cyclotron absorption. The high frequency electromagnetic field amplitude is high for optimum regimes with high efficiency level. In this case some electrons are accelerated and different electrons are decelerated during interaction inside device. As a result, cyclotron resonance conditions are different for different electron groups. The authors have found theoretically condition of dynamic cyclotron resonance when it is possible to improve efficiency of interaction in devices with distributed interaction such as TWT, BWO, generator of diffractional radiation by combination of Cherenkov and cyclotron interactions in strong nonlinear regimes with optimum efficiency levels. The numerical simulation of the interaction between initially linear electron beam and electromagnetic field show that there are regions of efficiency improvement up to 50 and amplitude of high-frequency electromagnetic field. One of the important features of such combined interaction is dependence on relativistic factor. They have found optimum region of relativistic factors by numerical simulation. The results of numerical simulation were compared with experimental data refer to relativistic diffractional generators and multiwave Cherenkov generators. Good agreement in value of optimum magnitude of guiding magnetic field was obtained.
- OSTI ID:
- 170200
- Report Number(s):
- CONF-950612-; ISBN 0-7803-2669-5; TRN: IM9605%%219
- Resource Relation:
- Conference: 22. international conference on plasma science, Madison, WI (United States), 5-8 Jun 1995; Other Information: PBD: 1995; Related Information: Is Part Of IEEE conference record -- abstracts: 1995 IEEE international conference on plasma science; PB: 312 p.
- Country of Publication:
- United States
- Language:
- English
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