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This content will become publicly available on November 15, 2017

Title: Near-field radiative heat transfer between doped-Si parallel plates separated by a spacing down to 200 nm

Authors:
 [1] ;  [1] ;  [1]
  1. George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, USA
Publication Date:
OSTI Identifier:
1332366
Grant/Contract Number:
FG02-06ER46343
Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 109; Journal Issue: 20; Related Information: CHORUS Timestamp: 2016-11-15 20:38:37; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English