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Title: Damage-free laser patterning of silicon nitride on textured crystalline silicon using an amorphous silicon etch mask for Ni/Cu plated silicon solar cells

Journal Article · · Thin Solid Films
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Sponsoring Organization:
USDOE Office of Energy Efficiency and Renewable Energy (EERE)
OSTI ID:
1328527
Journal Information:
Thin Solid Films, Journal Name: Thin Solid Films Vol. 612 Journal Issue: C; ISSN 0040-6090
Publisher:
ElsevierCopyright Statement
Country of Publication:
Netherlands
Language:
English
Citation Metrics:
Cited by: 5 works
Citation information provided by
Web of Science

References (8)

Electrical and Mechanical Properties of Plated Ni/Cu Contacts for Si Solar Cells journal August 2015
Localization and characterization of annealing-induced shunts in Ni-plated monocrystalline silicon solar cells: Localization and characterization of annealing-induced shunts in Ni-plated monocrystalline silicon solar cells journal February 2014
Overcoming electrical and mechanical challenges of continuous wave laser processing for Ni–Cu plated solar cells journal February 2015
Selective laser ablation of SiN x layers on textured surfaces for low temperature front side metallizations: LASER ABLATION OF SiN x ON TEXTURED SURFACES journal October 2008
Impact of surface topography and laser pulse duration for laser ablation of solar cell front side passivating SiNx layers journal December 2010
Guidelines for efficient direct ablation of dielectrics with single femtosecond pulses journal November 2013
N2O plasma treatment for minimization of background plating in silicon solar cells with Ni–Cu front side metallization journal January 2016
The Origin of Background Plating journal January 2011

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