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Title: Effects associated with nanostructure fabrication using in situ liquid cell TEM technology

Journal Article · · Nano-Micro Letters
 [1];  [2];  [2];  [2];  [2];  [2];  [2]
  1. East China Univ. of Science and Technology, Shanghai (People's Republic of China); Chinese Academy of Science, Shanghai (People's Republic of China)
  2. East China Univ. of Science and Technology, Shanghai (People's Republic of China)

We studied silicon, carbon, and SiCx nanostructures fabricated using liquid-phase electron-beam-induced deposition technology in transmission electron microscopy systems. Nanodots obtained from fixed electron beam irradiation followed a universal size versus beam dose trend, with precursor concentrations from pure SiCl4 to 0 % SiCl4 in CH2Cl2, and electron beamintensity ranges of two orders of magnitude, showing good controllability of the deposition. Secondary electrons contributed to the determination of the lateral sizes of the nanostructures, while the primary beam appeared to have an effect in reducing the vertical growth rate. These results can be used to generate donut-shaped nanostructures. Using a scanning electron beam, line structures with both branched and unbranched morphologies were also obtained. As a result, the liquid-phase electron-beam induced deposition technology is shown to be an effective tool for advanced nanostructured material generation.

Research Organization:
Univ. of Illinois, Chicago, IL (United States)
Sponsoring Organization:
USDOE
Grant/Contract Number:
FG02-07ER46453; FG02-07ER46471
OSTI ID:
1324961
Journal Information:
Nano-Micro Letters, Vol. 7, Issue 4; ISSN 2311-6706
Publisher:
SpringerCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 2 works
Citation information provided by
Web of Science

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Cited By (1)

Investigating materials formation with liquid-phase and cryogenic TEM journal June 2016

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