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Title: Effects associated with nanostructure fabrication using in situ liquid cell TEM technology

We studied silicon, carbon, and SiCx nanostructures fabricated using liquid-phase electron-beam-induced deposition technology in transmission electron microscopy systems. Nanodots obtained from fixed electron beam irradiation followed a universal size versus beam dose trend, with precursor concentrations from pure SiCl4 to 0 % SiCl4 in CH2Cl2, and electron beamintensity ranges of two orders of magnitude, showing good controllability of the deposition. Secondary electrons contributed to the determination of the lateral sizes of the nanostructures, while the primary beam appeared to have an effect in reducing the vertical growth rate. These results can be used to generate donut-shaped nanostructures. Using a scanning electron beam, line structures with both branched and unbranched morphologies were also obtained. As a result, the liquid-phase electron-beam induced deposition technology is shown to be an effective tool for advanced nanostructured material generation.
 [1] ;  [2] ;  [2] ;  [2] ;  [2] ;  [2] ;  [2]
  1. East China Univ. of Science and Technology, Shanghai (People's Republic of China); Chinese Academy of Science, Shanghai (People's Republic of China)
  2. East China Univ. of Science and Technology, Shanghai (People's Republic of China)
Publication Date:
OSTI Identifier:
Grant/Contract Number:
FG02-07ER46453; FG02-07ER46471
Accepted Manuscript
Journal Name:
Nano-Micro Letters
Additional Journal Information:
Journal Volume: 7; Journal Issue: 4; Journal ID: ISSN 2311-6706
Research Org:
Univ. of Illinois, Chicago, IL (United States)
Sponsoring Org:
Country of Publication:
United States
36 MATERIALS SCIENCE electron-beam-induced deposition; in situ TEM; nanostrucutre; semiconductor; nanolithography