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Title: Two-dimensional heterostructures: fabrication, characterization, and application

Journal Article · · Nanoscale
DOI:https://doi.org/10.1039/C4NR03435J· OSTI ID:1286748
 [1];  [1];  [2];  [3];  [4];  [5]
  1. Nanyang Technological Univ. (Singapore). School of Materials Science and Engineering
  2. Nanyang Technological Univ. (Singapore). School of Materials Science and Engineering
  3. Peking Univ., Beijing (China). School of Physics, State Key Lab. of Nuclear Physics; Collaborative Innovation Center of Quantum Matter, Beijing (China); Rice Univ., Houston, TX (United States). Lab. for Nanophotonics, Dept. of Electrical and Computer Engineering, Lab. for Nanophotonics
  4. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science & Technology Division
  5. Nanyang Technological Univ. (Singapore). School of Materials Science and Engineering; Nanyang Technological Univ. (Singapore). NOVITAS, Nanoelectronics Centre of Excellence; Nanyang Technological Univ. (Singapore). CINTRA CNRS/NTU/THALES

Two-dimensional (2D) materials such as graphene, hexagonal boron nitrides (hBN), and transition metal dichalcogenides (TMDs, e.g., MoS2) have attracted considerable attention in the past few years because of their novel properties and versatile potential applications. These 2D layers can be integrated into a monolayer (lateral 2D heterostructure) or a multilayer stack (vertical 2D heterostructure). The resulting artificial 2D structures provide access to new properties and applications beyond their component 2D atomic crystals and hence, they are emerging as a new exciting field of research. Lastly, in this article, we review recent progress on the fabrication, characterization, and applications of various 2D heterostructures.

Research Organization:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE Laboratory Directed Research and Development (LDRD) Program; USDOE Office of Science (SC), Basic Energy Sciences (BES)
DOE Contract Number:
AC05-00OR22725; NRF-RF2013-08; 2007CB936800; 11374023; 61176120; M4081137.070
OSTI ID:
1286748
Journal Information:
Nanoscale, Vol. 6, Issue 21; ISSN 2040-3364
Publisher:
Royal Society of Chemistry
Country of Publication:
United States
Language:
English

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