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Title: High gain durable anti-reflective coating

Patent ·
OSTI ID:1273457

Disclosed herein are polysilsesquioxane-based anti-reflective coating (ARC) compositions, methods of preparation, and methods of deposition on a substrate. In one embodiment, the polysilsesquioxane of this disclosure is prepared in a two-step process of acid catalyzed hydrolysis of organoalkoxysilane followed by addition of tetralkoxysilane that generates silicone polymers with >40 mol % silanol based on Si-NMR. These high silanol siloxane polymers are stable and have a long shelf-life in polar organic solvents at room temperature. Also disclosed are low refractive index ARC made from these compositions with and without additives such as porogens, templates, thermal radical initiator, photo radical initiators, crosslinkers, Si--OH condensation catalyst and nano-fillers. Also disclosed are methods and apparatus for applying coatings to flat substrates including substrate pre-treatment processes, coating processes and coating curing processes including skin-curing using hot-air knives. Also disclosed are coating compositions and formulations for highly tunable, durable, highly abrasion-resistant functionalized anti-reflective coatings.

Research Organization:
Enki Technology, Inc., San Jose, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
EE0006810
Assignee:
Enki Technology, Inc. (San Jose, CA)
Patent Number(s):
9,399,720
Application Number:
14/799,507
OSTI ID:
1273457
Resource Relation:
Patent File Date: 2015 Jul 14
Country of Publication:
United States
Language:
English

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  • Pop, Sergiu C.; Abbaraju, Venkata; Brophy, Brenor
  • 2014 IEEE 40th Photovoltaic Specialists Conference (PVSC), 2014 IEEE 40th Photovoltaic Specialist Conference (PVSC) https://doi.org/10.1109/PVSC.2014.6925490
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