Mask-Patterned Wet Etching of Thin Titanium Liquid/Gas Diffusion Layers for a PEMEC
- Authors:
-
- University of Tennessee Space Institute (UTSI)
- ORNL
- Publication Date:
- Research Org.:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
- Sponsoring Org.:
- USDOE Office of Science (SC)
- OSTI Identifier:
- 1265673
- DOE Contract Number:
- AC05-00OR22725
- Resource Type:
- Conference
- Resource Relation:
- Conference: 227th ECS Meeting, Chicago, IL, USA, 20150524, 20150528
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Mo, Jingke, SteenIII, Stuart M, Retterer, Scott T, Cullen, David A, Terekhov, Alexander Y, and Zhang, Feng-Yuan. Mask-Patterned Wet Etching of Thin Titanium Liquid/Gas Diffusion Layers for a PEMEC. United States: N. p., 2015.
Web.
Mo, Jingke, SteenIII, Stuart M, Retterer, Scott T, Cullen, David A, Terekhov, Alexander Y, & Zhang, Feng-Yuan. Mask-Patterned Wet Etching of Thin Titanium Liquid/Gas Diffusion Layers for a PEMEC. United States.
Mo, Jingke, SteenIII, Stuart M, Retterer, Scott T, Cullen, David A, Terekhov, Alexander Y, and Zhang, Feng-Yuan. 2015.
"Mask-Patterned Wet Etching of Thin Titanium Liquid/Gas Diffusion Layers for a PEMEC". United States.
@article{osti_1265673,
title = {Mask-Patterned Wet Etching of Thin Titanium Liquid/Gas Diffusion Layers for a PEMEC},
author = {Mo, Jingke and SteenIII, Stuart M and Retterer, Scott T and Cullen, David A and Terekhov, Alexander Y and Zhang, Feng-Yuan},
abstractNote = {},
doi = {},
url = {https://www.osti.gov/biblio/1265673},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Jan 01 00:00:00 EST 2015},
month = {Thu Jan 01 00:00:00 EST 2015}
}
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