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Title: Nuclear reaction analysis for H, Li, Be, B, C, N, O and F with an RBS check

Journal Article · · Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
 [1];  [1];  [2];  [2];  [2];  [3];  [3];  [3];  [4];  [4];  [4];  [5];  [5];  [6];  [6];  [7];  [7];  [7]
  1. Univ. at Albany, SUNY, NY (United States). Physics Dept.
  2. Univ. of Missouri-Kansas City, MO (United States). Dept. of Physics and Astronomy
  3. Univ. of Helsinki (Finland). Dept. of Chemistry
  4. Univ. of Oslo (Norway). Dept. of Chemistry
  5. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Solid State Division
  6. Univ. of Texas, Austin, TX (United States). Dept. of Electrical and Computer Engineering
  7. Intel Corporation, Hillsboro, OR (United States). Logic Technology Development
+ Show Author Affiliations

In this paper, 15N nuclear reaction analysis (NRA) for H is combined with 1.2 MeV deuteron (D) NRA which provides a simultaneous analysis for Li, Be, B, C, N, O and F. The energy dependence of the D NRA has been measured and used to correct for the D energy loss in film being analyzed. A 2 MeV He RBS measurement is made. Film composition is determined by a self-consistent analysis of the light element NRA data combined with an RBS analysis for heavy elements. This composition is used to simulate, with no adjustable parameters, the complete RBS spectrum. Finally, comparison of this simulated RBS spectrum with the measured spectrum provides a powerful check of the analysis.

Research Organization:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE
Grant/Contract Number:
AC05-00OR22725
OSTI ID:
1261264
Journal Information:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Vol. 371; ISSN 0168-583X
Publisher:
ElsevierCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 29 works
Citation information provided by
Web of Science

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Cited By (2)

Thermal conductivity-structure-processing relationships for amorphous nano-porous organo-silicate thin films journal December 2019
Thermal conductivity and thermal boundary resistance of atomic layer deposited high- k dielectric aluminum oxide, hafnium oxide, and titanium oxide thin films on silicon journal May 2018

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