Universal scaling in the aging of the strong glass former SiO2

Vollmayr-Lee, Katharina; Gorman, Christopher H.; Castillo, Horacio E.

doi:10.1063/1.4953911

Title: Universal scaling in the aging of the strong glass former SiO₂

Journal Article · Tue Jun 21 00:00:00 EDT 2016 · Journal of Chemical Physics

DOI:https://doi.org/10.1063/1.4953911· OSTI ID:1467569

^[1]; Gorman, Christopher H. ^[2];

^[3]

Bucknell Univ., Lewisburg, PA (United States)
Univ. of California, Santa Barbara, CA (United States)
Ohio Univ., Athens, OH (United States)

Here, we show that the aging dynamics of a strong glass former displays a strikingly simple scaling behavior, connecting the average dynamics with its fluctuations, namely, the dynamical heterogeneities. We perform molecular dynamics simulations of SiO₂ with van Beest-Kramer-van Santen interactions, quenching the system from high to low temperature, and study the evolution of the system as a function of the waiting time t_w measured from the instant of the quench. We find that both the aging behavior of the dynamic susceptibility χ₄ and the aging behavior of the probability distribution P(f_s,r) of the local incoherent intermediate scattering function f_s,r can be described by simple scaling forms in terms of the global incoherent intermediate scattering function C. The scaling forms are the same that have been found to describe the aging of several fragile glass formers and that, in the case of P(f_s,r), have been also predicted theoretically. A thorough study of the length scales involved highlights the importance of intermediate length scales. We also analyze directly the scaling dependence on particle type and on wavevector q and find that both the average and the fluctuations of the slow aging dynamics are controlled by a unique aging clock, which is not only independent of the wavevector q, but is also the same for O and Si atoms.

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Research Organization:: Bucknell Univ., Lewisburg, PA (United States)

Sponsoring Organization:: USDOE

Grant/Contract Number:: FG02-06ER46300

OSTI ID:: 1467569

Alternate ID(s):: OSTI ID: 1258495

Journal Information:: Journal of Chemical Physics, Vol. 144, Issue 23; ISSN 0021-9606

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 4 works

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