Investigation of GaP/Si Heteroepitaxy on MOCVD Prepared Si(100) Surfaces
Antiphase-domain (APD) free growth of GaP on Si has been achieved on Si surfaces prepared in situ by etching with AsH3. The pre-nucleation AsH3 etching removes O and C contaminants at a relatively low temperature, and creates a single-domain arsenic-terminated Si surface. The As-As dimer rows are all parallel to the step edges, and subsequent GaP growth by MOCVD retains this dimerization orientation. Both LEED and TEM indicate that the resulting epilayer is APD-free, and could thereby serve as a template for III-V/Si multijunction solar cells.
- Research Organization:
- National Renewable Energy Lab. (NREL), Golden, CO (United States)
- Sponsoring Organization:
- USDOE Office of Energy Efficiency and Renewable Energy (EERE), Renewable Power Office. Solar Energy Technologies Office
- DOE Contract Number:
- AC36-08GO28308
- OSTI ID:
- 1251108
- Report Number(s):
- NREL/CP-5J00-63595
- Resource Relation:
- Conference: Presented at the 2015 IEEE 42nd Photovoltaic Specialist Conference (PVSC), 14-19 June 2015, New Orleans, Louisiana; Related Information: Proceedings of the 2015 IEEE 42nd Photovoltaic Specialist Conference (PVSC), 14-19 June 2015, New Orleans, Louisiana
- Country of Publication:
- United States
- Language:
- English
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