Three-dimensional fabrication of free-standing epitaxial semiconductor nanostructures obtained by focused ion beam

Giliberti, V.; Sakat, E.; Baldassarre, L.; Di Gaspare, A.; Notargiacomo, A.; Giovine, E.; Frigerio, J.; Isella, G.; Melli, M.; Weber-Bargioni, A.; Aloni, S.; Sassolini, S.; Cabrini, S.; Biagioni, P.; Ortolani, M.; Bollani, M.

doi:10.1016/j.mee.2015.03.022

Title: Three-dimensional fabrication of free-standing epitaxial semiconductor nanostructures obtained by focused ion beam

Journal Article · Mon Jun 01 00:00:00 EDT 2015 · Microelectronic Engineering

DOI:https://doi.org/10.1016/j.mee.2015.03.022· OSTI ID:1245679

Giliberti, V.; Sakat, E.; Baldassarre, L.; Di Gaspare, A.; Notargiacomo, A.; Giovine, E.; Frigerio, J.; Isella, G.; Melli, M.; Weber-Bargioni, A.; Aloni, S.; Sassolini, S.; Cabrini, S.; Biagioni, P.; Ortolani, M.; Bollani, M.

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Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 1245679

Journal Information:: Microelectronic Engineering, Journal Name: Microelectronic Engineering Vol. 141 Journal Issue: C; ISSN 0167-9317

Publisher:: ElsevierCopyright Statement

Country of Publication:: Netherlands

Language:: English

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Cited by: 7 works

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References (21)

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