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Title: Injection deep level transient spectroscopy: An improved method for measuring capture rates of hot carriers in semiconductors

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4923358· OSTI ID:1239986

In this study, an improved method for measuring the cross sections for carrier trapping at defects in semiconductors is described. This method, a variation of deep level transient spectroscopy(DLTS) used with bipolar transistors, is applied to hot carrier trapping at vacancy-oxygen, carbon-oxygen, and three charge states of divacancy centers (V2) in n- and p-type silicon. Unlike standard DLTS, we fill traps by injecting carriers into the depletion region of a bipolar transistor diode using a pulse of forward bias current applied to the adjacent diode. We show that this technique is capable of accurately measuring a wide range of capture cross sections at varying electric fields due to the control of the carrier density it provides. Because this technique can be applied to a variety of carrier energy distributions, it should be valuable in modeling the effect of radiation-induced generation-recombination currents in bipolar devices.

Research Organization:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA)
Grant/Contract Number:
AC04-94AL85000
OSTI ID:
1239986
Alternate ID(s):
OSTI ID: 1228652
Report Number(s):
SAND-2015-5982J; JAPIAU; 618345
Journal Information:
Journal of Applied Physics, Vol. 118, Issue 1; ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 2 works
Citation information provided by
Web of Science

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Cited By (1)

Vapor transport deposition of antimony selenide thin film solar cells with 7.6% efficiency journal June 2018