Automated Geometry assisted PEC for electron beam direct write nanolithography

Journal Article · Tue Dec 01 00:00:00 EST 2015 · Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics

DOI:https://doi.org/10.1116/1.4931691· OSTI ID:1237841

Ocola, Leonidas E.; Gosztola, David J.; Rosenmann, Daniel; Lopez, Gerald Gabriel

Nanoscale geometry assisted proximity effect correction (NanoPEC) is demonstrated to improve PEC for nanoscale structures over standard PEC, in terms of feature sharpness for sub-100 nm structures. The method was implemented onto an existing commercially available PEC software. Plasmonic arrays of crosses were fabricated using regular PEC and NanoPEC, and optical absorbance was measured. Results confirm that the improved sharpness of the structures leads to increased sharpness in the optical absorbance spectrum features. We also demonstrated that this method of PEC is applicable to arbitrary shaped structures beyond crosses.

• Research Organization: Argonne National Lab. (ANL), Argonne, IL (United States)
• Sponsoring Organization: USDOE Office of Science (SC); USDOE U.S. Department of Energy
• DOE Contract Number: AC02-06CH11357
• OSTI ID: 1237841
• Journal Information: Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics, Vol. 33, Issue 6; ISSN 2166-2746
• Publisher: American Vacuum Society/AIP
• Country of Publication: United States
• Language: English