Thermal transport in tantalum oxide films for memristive applications
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Colorado School of Mines, Golden, CO (United States)
The thermal conductivity of amorphous TaOx memristive films having variable oxygen content is measured using time domain thermoreflectance. Furthermore, the thermal transport is described by a two-partmodel where the electrical contribution is quantified via the Wiedemann-Franz relation and the vibrational contribution by the minimum thermal conductivity limit for amorphous solids. Additionally, the vibrational contribution remains constant near 0.9 W/mK regardless of oxygen concentration, while the electrical contribution varies from 0 to 3.3 W/mK. Thus, the dominant thermal carrier in TaOx switches between vibrations and charge carriers and is controllable either by oxygen content during deposition, or dynamically by field-induced charge state migration.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA)
- Grant/Contract Number:
- AC04-94AL85000
- OSTI ID:
- 1235298
- Alternate ID(s):
- OSTI ID: 1226772
- Report Number(s):
- SAND-2015-1010J; 566977; TRN: US1600384
- Journal Information:
- Applied Physics Letters, Vol. 107, Issue 02; Related Information: See also the erratum at http://dx.doi.org/10.1063/1.4928532; ISSN 0003-6951
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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