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Title: First principles-based multiparadigm, multiscale strategy for simulating complex materials processes with applications to amorphous SiC films

Journal Article · · The Journal of Chemical Physics
DOI:https://doi.org/10.1063/1.4919797· OSTI ID:1228128
 [1];  [2];  [3];  [3]
  1. Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, California 90089-1211, USA, Materials and Process Simulation Center, California Institute of Technology, Pasadena, California 91125, USA
  2. Materials and Process Simulation Center, California Institute of Technology, Pasadena, California 91125, USA
  3. Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, California 90089-1211, USA
+ Show Author Affiliations

Sponsoring Organization:
USDOE
OSTI ID:
1228128
Journal Information:
The Journal of Chemical Physics, Journal Name: The Journal of Chemical Physics Vol. 142 Journal Issue: 17; ISSN 0021-9606
Publisher:
American Institute of PhysicsCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 10 works
Citation information provided by
Web of Science

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