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Title: Processing and crystallographic structure of non-equilibrium Si-doped HfO[subscript 2]

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4923023· OSTI ID:1225084

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Organization:
DOE - BASIC ENERGY SCIENCESFOREIGN
OSTI ID:
1225084
Journal Information:
Journal of Applied Physics, Vol. 117, Issue (24) ; 06, 2015; ISSN 0021-8979
Country of Publication:
United States
Language:
ENGLISH

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