Facile electron-beam lithography technique for irregular and fragile substrates

Chang, Jiyoung; Zhou, Qin; Zettl, Alex

doi:10.1063/1.4900505

Title: Facile electron-beam lithography technique for irregular and fragile substrates

Journal Article · Wed Oct 29 00:00:00 EDT 2014 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4900505· OSTI ID:1224258

Chang, Jiyoung ^[1]; Zhou, Qin ^[1]; Zettl, Alex ^[1]

Department of Physics, University of California at Berkeley, Berkeley, California 94720, USA, Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA, Kavli Energy NanoSciences Institute at the University of California, Berkeley, California 94720, USA

View Accepted Manuscript (Publisher)

Cite

Export

Save

Sponsoring Organization:: USDOE

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 1224258

Journal Information:: Applied Physics Letters, Journal Name: Applied Physics Letters Vol. 105 Journal Issue: 17; ISSN 0003-6951

Publisher:: American Institute of PhysicsCopyright Statement

Country of Publication:: United States

Language:: English

Citation Metrics:

Cited by: 4 works

Citation information provided by
Web of Science

References (15)

Effect of flexural modes on squeeze film damping in MEMS cantilever resonators Pandey, Ashok Kumar; Pratap, Rudra Journal of Micromechanics and Microengineering, Vol. 17, Issue 12 https://doi.org/10.1088/0960-1317/17/12/013	journal	November 2007
Nanoscale Patterning of Protein Using Electron Beam Lithography of Organosilane Self-Assembled Monolayers Zhang, Guo-Jun; Tanii, Takashi; Zako, Tamotsu Small, Vol. 1, Issue 8-9 https://doi.org/10.1002/smll.200500091	journal	August 2005
Application of dry film resist in the fabrication of microfluidic chips for droplet generation Leech, P. W.; Wu, N.; Zhu, Y. Journal of Micromechanics and Microengineering, Vol. 19, Issue 6 https://doi.org/10.1088/0960-1317/19/6/065019	journal	May 2009
Focused ion beam induced deposition of platinum for repair processes Tao, Tao Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 9, Issue 1 https://doi.org/10.1116/1.585279	journal	January 1991
Nanopatterning on Nonplanar and Fragile Substrates with Ice Resists Han, Anpan; Kuan, Aaron; Golovchenko, Jene Nano Letters, Vol. 12, Issue 2 https://doi.org/10.1021/nl204198w	journal	January 2012
Electrostatically excited and capacitively detected flexural plate waves on thin silicon nitride membranes with chemical sensor applications Giesler, T.; Meyer, J. -U. Sensors and Actuators B: Chemical, Vol. 18, Issue 1-3 https://doi.org/10.1016/0925-4005(94)87066-7	journal	March 1994
Nano patterning on optical fiber and laser diode facet with dry resist Kelkar, P. S.; Beauvais, J.; Lavallée, E. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, Issue 3 https://doi.org/10.1116/1.1667503	journal	January 2004
Lab-on-Fiber Technology: Toward Multifunctional Optical Nanoprobes Consales, Marco; Ricciardi, Armando; Crescitelli, Alessio ACS Nano, Vol. 6, Issue 4 https://doi.org/10.1021/nn204953e	journal	March 2012
Nanoelectromechanical Systems Craighead, H. G. Science, Vol. 290, Issue 5496 https://doi.org/10.1126/science.290.5496.1532	journal	November 2000
Tunable Superlattice in Graphene To Control the Number of Dirac Points Dubey, Sudipta; Singh, Vibhor; Bhat, Ajay K. Nano Letters, Vol. 13, Issue 9 https://doi.org/10.1021/nl4006029	journal	August 2013
Spray coating of PMMA for pattern transfer via electron beam lithography on surfaces with high topography Linden, J.; Thanner, Ch.; Schaaf, B. Microelectronic Engineering, Vol. 88, Issue 8 https://doi.org/10.1016/j.mee.2010.12.106	journal	August 2011
Electron Beam Lithography on Irregular Surfaces Using an Evaporated Resist Zhang, Jian; Con, Celal; Cui, Bo ACS Nano, Vol. 8, Issue 4 https://doi.org/10.1021/nn4064659	journal	March 2014
Solid-State Thermal Rectifier Chang, C. W.; Okawa, D.; Majumdar, A. Science, Vol. 314, Issue 5802 https://doi.org/10.1126/science.1132898	journal	November 2006
Hybrid Nanoimprint−Soft Lithography with Sub-15 nm Resolution Li, Zhiwei; Gu, Yanni; Wang, Lei Nano Letters, Vol. 9, Issue 6 https://doi.org/10.1021/nl9004892	journal	June 2009
Electromechanical Resonators from Graphene Sheets Bunch, J. S.; van der Zande, A. M.; Verbridge, S. S. Science, Vol. 315, Issue 5811 https://doi.org/10.1126/science.1136836	journal	January 2007

Similar Records

Facile electron-beam lithography technique for irregular and fragile substrates

Journal Article · Mon Oct 27 00:00:00 EDT 2014 · Applied Physics Letters · OSTI ID:1224258

Chang, Jiyoung; Zhou, Qin; Zettl, Alex

Electron beam interaction with substrate in electron beam lithography: A scaling experiment to test transport theory

Journal Article · Tue Nov 01 00:00:00 EST 1988 · J. Vac. Sci. Technol., B; (United States) · OSTI ID:1224258

Schmoranzer, H

Mitigating challenges in aberration-corrected electron-beam lithography on electron-opaque substrates

Journal Article · Thu Nov 23 00:00:00 EST 2023 · Nanotechnology · OSTI ID:1224258

Camino, Fernando E.; Tiwale, Nikhil; Hwang, Sooyeon; +2 more

Title: Facile electron-beam lithography technique for irregular and fragile substrates

Citation Formats

References (15)

Similar Records

Related Subjects