Fermi level control of compensating point defects during metalorganic chemical vapor deposition growth of Si-doped AlGaN
A Fermi-level control scheme for point defect management using above-bandgap UV illumination during growth is presented. We propose an extension to the analogy between the Fermi level and the electrochemical potential such that the electrochemical potential of a charged defect in a material with steady-state populations of free charge carriers may be expressed in terms of the quasi-Fermi levels. A series of highly Si-doped Al0.65Ga0.35N films grown by metalorganic chemical vapor deposition with and without UV illumination showed that samples grown under UV illumination had increased free carrier concentration, free carrier mobility, and reduced midgap photoluminescence all indicating a reduction in compensating point defects. (c) 2014 AIP Publishing LLC.
- Sponsoring Organization:
- USDOE Advanced Research Projects Agency - Energy (ARPA-E)
- DOE Contract Number:
- DE-AR0000299
- OSTI ID:
- 1211342
- Journal Information:
- Applied Physics Letters, Vol. 105, Issue 22; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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