skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Phase transitions in metastable phases of silicon

Journal Article · · J. Appl. Phys.
DOI:https://doi.org/10.1063/1.4868156· OSTI ID:1210835

Research Organization:
Energy Frontier Research Centers (EFRC) (United States). Energy Frontier Research in Extreme Environments (EFree)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
DOE Contract Number:
SC0001057
OSTI ID:
1210835
Journal Information:
J. Appl. Phys., Vol. 115; Related Information: EFree partners with Carnegie Institution of Washington (lead); California Institute of Technology; Colorado School of Mines; Cornell University; Lehigh University; Pennsylvania State University
Country of Publication:
United States
Language:
English

References (42)

Thermal stability of metastable silicon phases produced by nanoindentation journal March 2004
Strength and sharp contact fracture of silicon journal February 2006
Phase transformations during microcutting tests on silicon journal November 1996
Indentation-induced phase transformations in silicon: influences of load, rate and indenter angle on the transformation behavior journal April 2005
In situ Raman characterization of reversible phase transition in stress-induced amorphous silicon journal September 2007
Experimental evidence for semiconducting behavior of Si-XII journal February 2011
Electrical properties of semimetallic silicon III and semiconductive silicon IV at ambient pressure journal July 1987
Comment on ``Experimental evidence for semiconducting behavior of Si-XII'' journal December 2011
Raman Scattering from Phonons in Polymorphs of Si and Ge journal September 1972
The effects of microcrystal size and shape on the one phonon Raman spectra of crystalline semiconductors journal June 1986
Effect of phase transformations on the shape of the unloading curve in the nanoindentation of silicon journal April 2000
Effect of Pressure on Raman Spectra of Metastable Phases of Si and Ge journal January 1999
Improvement in the mechanical performance of Czochralski silicon under indentation by germanium doping journal May 2011
Temperature dependence of the first-order Raman scattering by phonons in Si, Ge, and α S n : Anharmonic effects journal February 1984
Annealing kinetics of nanoindentation-induced polycrystalline high pressure phases in crystalline silicon journal March 2007
Characterisation of Si III and Si IV, metastable forms of silicon at ambient pressure journal April 1989
Specific volume measurements of Cu, Mo, Pd, and Ag and calibration of the ruby R 1 fluorescence pressure gauge from 0.06 to 1 Mbar journal June 1978
Micro-Raman spectroscopy to study local mechanical stress in silicon integrated circuits journal February 1996
Synthesis of Silicon Nanowires with Wurtzite Crystalline Structure by Using Standard Chemical Vapor Deposition journal May 2007
Patterning of silicon by indentation and chemical etching journal September 2007
Raman scattering and phonon dispersion in Si and GaP at very high pressure journal August 1975
Crystal data for high-pressure phases of silicon journal October 1986
Structure and properties of silicon XII: A complex tetrahedrally bonded phase journal August 1995
Annealing of nanoindentation-induced high pressure crystalline phases created in crystalline and amorphous silicon journal May 2009
In situ x-ray diffraction study of silicon at pressures up to 15.5 GPa and temperatures up to 1073 K journal July 2003
New high-pressure phase of Si journal April 1993
Thermal Conductivity of Nanocrystalline Silicon: Importance of Grain Size and Frequency-Dependent Mean Free Paths journal June 2011
Phase transformations of silicon caused by contact loading journal April 1997
Raman scattering in metallic Si and Ge up to 50 GPa journal April 1992
Crystal Structures at High Pressures of Metallic Modifications of Silicon and Germanium journal February 1963
Electrical properties of semimetallic silicon III and semiconductive silicon IV at ambient pressure journal July 1987
Crystal data for high-pressure phases of silicon journal October 1986
In situ x-ray diffraction study of silicon at pressures up to 15.5 GPa and temperatures up to 1073 K journal July 2003
New high-pressure phase of Si journal April 1993
Structure and properties of silicon XII: A complex tetrahedrally bonded phase journal August 1995
Comment on ``Experimental evidence for semiconducting behavior of Si-XII'' journal December 2011
Raman Scattering from Phonons in Polymorphs of Si and Ge journal September 1972
Raman scattering and phonon dispersion in Si and GaP at very high pressure journal August 1975
Raman scattering in metallic Si and Ge up to 50 GPa journal April 1992
Effect of Pressure on Raman Spectra of Metastable Phases of Si and Ge journal January 1999
Experimental evidence for semiconducting behavior of Si-XII journal February 2011
Temperature dependence of the first-order Raman scattering by phonons in Si, Ge, and α S n : Anharmonic effects journal February 1984

Cited By (5)

Nano-deformation behavior of silicon (100) film studied by depth sensing indentation and nanoscratch technique journal April 2018
A Review on Micro- and Nanoscratching/Tribology at High Temperatures: Instrumentation and Experimentation journal July 2018
Thermal evolution of the indentation-induced phases of silicon journal September 2019
In-situ high temperature micro-Raman investigation of annealing behavior of high-pressure phases of Si journal June 2019
Analysis of residual stress around a Berkovich nano-indentation by micro-Raman spectroscopy journal January 2019