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Title: Atomic Layer Deposition of the Solid Electrolyte LiPON

Journal Article · · Chemistry of Materials
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  1. Department of Materials Science & Engineering and ‡Institute for Systems Research, University of Maryland, College Park, Maryland 20742, United States

We demonstrate an atomic layer deposition (ALD) process for the solid electrolyte lithium phosphorousoxynitride (LiPON) using lithium tert-butoxide (LiOtBu), H2O, trimethylphosphate (TMP), and plasma N2 (PN2) as precursors. We use in-situ spectroscopic ellipsometry to determine growth rates for process optimization to design a rational, quaternary precursor ALD process where only certain substrate–precursor chemical reactions are favorable. We demonstrate via in-situ XPS tunable nitrogen incorporation into the films by variation of the PN2 dose and find that ALD films over approximately 4.5% nitrogen are amorphous, whereas LiPON ALD films with less than 4.5% nitrogen are polycrystalline. Lastly, we characterize the ionic conductivity of the ALD films as a function of nitrogen content and demonstrate their functionality on a model battery electrode—a Si anode on a Cu current collector.

Research Organization:
Energy Frontier Research Centers (EFRC) (United States). Nanostructures for Electrical Energy Storage (NEES)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
SC0001160
OSTI ID:
1206791
Alternate ID(s):
OSTI ID: 1385989
Journal Information:
Chemistry of Materials, Journal Name: Chemistry of Materials Vol. 27 Journal Issue: 15; ISSN 0897-4756
Publisher:
American Chemical SocietyCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 179 works
Citation information provided by
Web of Science

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