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Title: The Seebeck Coefficient and Phonon Drag in Silicon

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4904925· OSTI ID:1185754
 [1];  [2];  [3]
  1. Pennsylvania State Univ., University Park, PA (United States)
  2. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
  3. Boston College, Chestnut Hill, MA (United States)

We present a theory of the phonon-drag Seebeck coe cient in nondegenerate semiconductors, and apply it to silicon for temperatures 30 < T < 300K. Our calculation uses only parameters from the literature, and previous calculations of the phonon lifetime. We nd excellent agreement with the measurements of Geballe and Hull [Phys.Rev. 98, 940 (1955)]. The phonon-drag term dominates at low temperature, and shows an important dependence on the dimensions of the experimental sample.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
Grant/Contract Number:
AC05-00OR22725
OSTI ID:
1185754
Journal Information:
Journal of Applied Physics, Vol. 116; ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 36 works
Citation information provided by
Web of Science

References (29)

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Cited By (6)

Enhancing the Seebeck effect in Ge/Si through the combination of interfacial design features journal November 2019
Introduction to thermoelectrics journal October 2016
Ab initio optimization of phonon drag effect for lower-temperature thermoelectric energy conversion journal November 2015
First-principles calculations of thermal, electrical, and thermoelectric transport properties of semiconductors journal March 2016
A microstructuring route to enhanced thermoelectric efficiency of reduced graphene oxide films journal April 2019
Thermoelectric coefficients of n -doped silicon from first principles via the solution of the Boltzmann transport equation journal August 2016

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