Enlarged Pore Size in Mesoporous Silica Films Templated by Pluronic F127: Use of Poloxamer Mixtures and Increased Template/SiO[subscript 2] Ratios in Materials Synthesized by Evaporation-Induced Self-Assembly
- UNM
- Research Organization:
- Argonne National Laboratory (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
- Sponsoring Organization:
- DOE - BASIC ENERGY SCIENCES
- OSTI ID:
- 1173014
- Journal Information:
- Chem. Mater., Vol. 27, Issue (1) ; 01, 2015
- Country of Publication:
- United States
- Language:
- ENGLISH
Cited by: 41 works
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