Real-Time Observation of Atomic Layer Deposition Inhibition: Metal Oxide Growth on Self-Assembled Alkanethiols

Avila, Jason R.; DeMarco, Erica J.; Emery, Jonathan D.; Farha, Omar K.; Pellin, Michael J.; Hupp, Joseph T.; Martinson, Alex B. F.

doi:10.1021/am503008j

Title: Real-Time Observation of Atomic Layer Deposition Inhibition: Metal Oxide Growth on Self-Assembled Alkanethiols

Journal Article · Wed Aug 13 00:00:00 EDT 2014 · ACS Applied Materials & Interfaces

DOI:https://doi.org/10.1021/am503008j· OSTI ID:1168380

Avila, Jason R.; DeMarco, Erica J.; Emery, Jonathan D.; Farha, Omar K.; Pellin, Michael J.; Hupp, Joseph T.; Martinson, Alex B. F.

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Research Organization:: Energy Frontier Research Centers (EFRC) (United States). Argonne-Northwestern Solar Energy Research Center (ANSER)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

DOE Contract Number:: SC0001059

OSTI ID:: 1168380

Journal Information:: ACS Applied Materials & Interfaces, Vol. 6; Related Information: ANSER partners with Northwestern University (lead); Argonne National Laboratory; University of Chicago; University of Illinois, Urbana-Champaign; Yale University

Country of Publication:: United States

Language:: English

References (37)

Atomic Layer Deposition: An Overview George, Steven M. Chemical Reviews, Vol. 110, Issue 1, p. 111-131 https://doi.org/10.1021/cr900056b	journal	January 2010
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process Puurunen, Riikka L. Journal of Applied Physics, Vol. 97, Issue 12, Article No. 121301 https://doi.org/10.1063/1.1940727	journal	June 2005
Applications of atomic layer deposition to nanofabrication and emerging nanodevices Kim, Hyungjun; Lee, Han-Bo-Ram; Maeng, W.-J. Thin Solid Films, Vol. 517, Issue 8, p. 2563-2580 https://doi.org/10.1016/j.tsf.2008.09.007	journal	February 2009
A DFT Study of the Al ₂ O ₃ Atomic Layer Deposition on SAMs: Effect of SAM Termination Xu, Ye; Musgrave, Charles B. Chemistry of Materials, Vol. 16, Issue 4 https://doi.org/10.1021/cm035009p	journal	February 2004
Self-Assembled Octadecyltrimethoxysilane Monolayers Enabling Selective-Area Atomic Layer Deposition of Iridium Färm, E.; Kemell, M.; Ritala, M. Chemical Vapor Deposition, Vol. 12, Issue 7 https://doi.org/10.1002/cvde.200604219	journal	July 2006
Microcontact patterning of ruthenium gate electrodes by selective area atomic layer deposition Park, K. J.; Doub, J. M.; Gougousi, T. Applied Physics Letters, Vol. 86, Issue 5 https://doi.org/10.1063/1.1852079	journal	January 2005
Area-Selective ALD with Soft Lithographic Methods: Using Self-Assembled Monolayers to Direct Film Deposition Jiang, Xirong; Bent, Stacey F. The Journal of Physical Chemistry C, Vol. 113, Issue 41 https://doi.org/10.1021/jp905317n	journal	September 2009
Selective-area atomic layer deposition with microcontact printed self-assembled octadecyltrichlorosilane monolayers as mask layers Färm, Elina; Kemell, Marianna; Ritala, Mikko Thin Solid Films, Vol. 517, Issue 2 https://doi.org/10.1016/j.tsf.2008.08.191	journal	November 2008
Nucleation and Growth of Noble Metals on Oxide Surfaces Using Atomic Layer Deposition Elam, J. W.; Zinovev, A. V. V.; Pellin, Michael J. ECS Transactions, Vol. 3, Issue 15, p. 271-278 https://doi.org/10.1149/1.2721496	journal	January 2007
Nucleation-Controlled Growth of Nanoparticles by Atomic Layer Deposition Lee, Han-Bo-Ram; Mullings, Marja N.; Jiang, Xirong Chemistry of Materials, Vol. 24, Issue 21 https://doi.org/10.1021/cm3014978	journal	October 2012
Passivation of copper surfaces for selective-area ALD using a thiol self-assembled monolayer Färm, Elina; Vehkamäki, Marko; Ritala, Mikko Semiconductor Science and Technology, Vol. 27, Issue 7 https://doi.org/10.1088/0268-1242/27/7/074004	journal	June 2012
Selective Atomic Layer Deposition of Titanium Oxide on Patterned Self-Assembled Monolayers Formed by Microcontact Printing Park, Mi H.; Jang, Young J.; Sung-Suh, Hyung M. Langmuir, Vol. 20, Issue 6 https://doi.org/10.1021/la035760c	journal	March 2004
Nanoscale Patterning of Organosilane Molecular Thin Films from the Gas Phase and Its Applications: Fabrication of Multifunctional Surfaces and Large Area Molecular Templates for Site-Selective Material Deposition George, Antony; Knez, Mato; Hlawacek, Gregor Langmuir, Vol. 28, Issue 5 https://doi.org/10.1021/la204437r	journal	January 2012
Effects of Interfacial Organic Layers on Nucleation, Growth, and Morphological Evolution in Atomic Layer Thin Film Deposition Dube, Abhishek; Sharma, Manish; Ma, Paul F. The Journal of Physical Chemistry C, Vol. 111, Issue 29 https://doi.org/10.1021/jp072264e	journal	July 2007
Self-assembled monolayer resist for atomic layer deposition of HfO2 and ZrO2 high-κ gate dielectrics Chen, Rong; Kim, Hyoungsub; McIntyre, Paul C. Applied Physics Letters, Vol. 84, Issue 20 https://doi.org/10.1063/1.1751211	journal	May 2004
Investigation of Self-Assembled Monolayer Resists for Hafnium Dioxide Atomic Layer Deposition Chen, Rong; Kim, Hyoungsub; McIntyre, Paul C. Chemistry of Materials, Vol. 17, Issue 3 https://doi.org/10.1021/cm0486666	journal	February 2005
Quartz Crystal Microbalance Studies of Al ₂ O ₃ Atomic Layer Deposition Using Trimethylaluminum and Water at 125 °C ^† Wind, R. A.; George, S. M. The Journal of Physical Chemistry A, Vol. 114, Issue 3 https://doi.org/10.1021/jp9049268	journal	January 2010
Atomic Layer Deposition of Titanium Oxide on Self-Assembled-Monolayer-Coated Gold Seo, Eun K.; Lee, Jung W.; Sung-Suh, Hyung M. Chemistry of Materials, Vol. 16, Issue 10 https://doi.org/10.1021/cm035140x	journal	May 2004
Atomic layer deposition of aluminum oxide on hydrophobic and hydrophilic surfaces Kobayashi, Nobuhiko P.; Donley, Carrie L.; Wang, Shih-Yuan Journal of Crystal Growth, Vol. 299, Issue 1 https://doi.org/10.1016/j.jcrysgro.2006.11.224	journal	February 2007
Identification and Passivation of Defects in Self-Assembled Monolayers Preiner, Michael J.; Melosh, Nicholas A. Langmuir, Vol. 25, Issue 5 https://doi.org/10.1021/la804162a	journal	February 2009
Nano/Subnanometer Pd Nanoparticles on Oxide Supports Synthesized by AB-type and Low-Temperature ABC-type Atomic Layer Deposition: Growth and Morphology ^† Lu, Junling; Stair, Peter C. Langmuir, Vol. 26, Issue 21 https://doi.org/10.1021/la101378s	journal	November 2010
Design and implementation of an integral wall-mounted quartz crystal microbalance for atomic layer deposition Riha, Shannon C.; Libera, Joseph A.; Elam, Jeffrey W. Review of Scientific Instruments, Vol. 83, Issue 9 https://doi.org/10.1063/1.4753935	journal	September 2012
Self-Assembled Monolayers of Thiolates on Metals as a Form of Nanotechnology Love, J. Christopher; Estroff, Lara A.; Kriebel, Jennah K. Chemical Reviews, Vol. 105, Issue 4 https://doi.org/10.1021/cr0300789	journal	April 2005
Atomic layer deposition of tin oxide films using tetrakis(dimethylamino) tin Elam, Jeffrey W.; Baker, David A.; Hryn, Alexander J. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 26, Issue 2 https://doi.org/10.1116/1.2835087	journal	March 2008
Growth Kinetics and Crystallization Behavior of TiO[sub 2] Films Prepared by Plasma Enhanced Atomic Layer Deposition Xie, Qi; Musschoot, Jan; Deduytsche, Davy Journal of The Electrochemical Society, Vol. 155, Issue 9 https://doi.org/10.1149/1.2955724	journal	January 2008
Analytical model for island growth in atomic layer deposition using geometrical principles Nilsen, O.; Mohn, C. E.; Kjekshus, A. Journal of Applied Physics, Vol. 102, Issue 2 https://doi.org/10.1063/1.2756514	journal	July 2007
Low-temperature atomic-layer-deposition lift-off method for microelectronic and nanoelectronic applications Biercuk, M. J.; Monsma, D. J.; Marcus, C. M. Applied Physics Letters, Vol. 83, Issue 12 https://doi.org/10.1063/1.1612904	journal	September 2003
Comparison of Dye-Sensitized Rutile- and Anatase-Based TiO ₂ Solar Cells Park, N. -G.; van de Lagemaat, J.; Frank, A. J. The Journal of Physical Chemistry B, Vol. 104, Issue 38 https://doi.org/10.1021/jp994365l	journal	September 2000
Atomic Layer Chemical Vapor Deposition of TiO[sub 2] Low Temperature Epitaxy of Rutile and Anatase Schuisky, Mikael; Hårsta, Anders; Aidla, Aleks Journal of The Electrochemical Society, Vol. 147, Issue 9 https://doi.org/10.1149/1.1393901	journal	January 2000
Oxidation of gold by ultraviolet light and ozone at 25 °C King, David E. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 13, Issue 3 https://doi.org/10.1116/1.579869	journal	May 1995
Self-assembled monolayers of thiols and dithiols on gold: new challenges for a well-known system Vericat, C.; Vela, M. E.; Benitez, G. Chemical Society Reviews, Vol. 39, Issue 5 https://doi.org/10.1039/b907301a	journal	January 2010
Anomalous effect of temperature on atomic layer deposition of titanium dioxide Aarik, Jaan; Aidla, Aleks; Mändar, Hugo Journal of Crystal Growth, Vol. 220, Issue 4 https://doi.org/10.1016/S0022-0248(00)00897-6	journal	December 2000
Growth of ZnO/Al₂O₃ Alloy Films Using Atomic Layer Deposition Techniques Elam, J. W.; George, S. M. Chemistry of Materials, Vol. 15, Issue 4 https://doi.org/10.1021/cm020607+	journal	February 2003
Study of atomic layer epitaxy of zinc oxide by in-situ quartz crystal microgravimetry Yousfi, El Bekkaye; Fouache, Jacques; Lincot, Daniel Applied Surface Science, Vol. 153, Issue 4, p. 223-234 https://doi.org/10.1016/S0169-4332(99)00330-X	journal	January 2000
Conformal hydrophobic coatings prepared using atomic layer deposition seed layers and non-chlorinated hydrophobic precursors Herrmann, Cari F.; DelRio, Frank W.; Bright, Victor M. Journal of Micromechanics and Microengineering, Vol. 15, Issue 5 https://doi.org/10.1088/0960-1317/15/5/013	journal	March 2005
Atomic Layer Deposition of Aluminum Oxide in Mesoporous Silica Gel Elam, Jeffrey W.; Libera, Joseph A.; Huynh, Trang H. The Journal of Physical Chemistry C, Vol. 114, Issue 41 https://doi.org/10.1021/jp1030587	journal	September 2010
Interaction of Sulfur with Well-Defined Metal and Oxide Surfaces: Unraveling the Mysteries behind Catalyst Poisoning and Desulfurization Rodriguez, José A.; Hrbek, Jan Accounts of Chemical Research, Vol. 32, Issue 9 https://doi.org/10.1021/ar9801191	journal	September 1999

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Title: Real-Time Observation of Atomic Layer Deposition Inhibition: Metal Oxide Growth on Self-Assembled Alkanethiols

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References (37)

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