Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair
Journal Article
·
· Applied Physics A
- University of Tennessee, Knoxville (UTK)
- The University of Tennessee
- ORNL
- Graz University of Technology
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- DE-AC05-00OR22725
- OSTI ID:
- 1163601
- Journal Information:
- Applied Physics A, Vol. 1
- Country of Publication:
- United States
- Language:
- English
Similar Records
Protection of extreme ultraviolet lithography masks. II. Showerhead flow mitigation of nanoscale particulate contamination [Protection of EUV lithography masks II: Showerhead flow mitigation of nanoscale particulate contamination]
Mask blanks for extreme ultraviolet lithography: Ion beam sputter deposition of low defect density Mo/Si multilayers
Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography
Journal Article
·
Fri Mar 27 00:00:00 EDT 2015
· Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics
·
OSTI ID:1163601
+5 more
Mask blanks for extreme ultraviolet lithography: Ion beam sputter deposition of low defect density Mo/Si multilayers
Journal Article
·
Sat Nov 01 00:00:00 EST 1997
· Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena
·
OSTI ID:1163601
+2 more
Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography
Journal Article
·
Mon May 25 00:00:00 EDT 2009
· Applied Optics
·
OSTI ID:1163601