Integration of Atomic Layer Deposition CeO2 Thin Films with Functional Complex Oxides and 3D Patterns

Journal Article · Wed Jan 01 00:00:00 EST 2014 · Thin Solid Films

DOI:https://doi.org/10.1016/j.tsf.2013.08.131· OSTI ID:1149773

Coll, M. ^[1]; Palau, A ^[1]; Gonzalez-rosillo, J ^[1]; Gazquez, Jaume ^[2]; Obradors, X. ^[1]; Puig, T. ^[1]

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1. ICMAB, Barcelona, Spain
2. Institut de Ciència de Materials de Barcelona, ICMAB-CSIC, Bellaterra, Spain

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
• Sponsoring Organization: USDOE Office of Science (SC)
• DOE Contract Number: DE-AC05-00OR22725
• OSTI ID: 1149773
• Journal Information: Thin Solid Films, Vol. 553; ISSN 0040-6090
• Country of Publication: United States
• Language: English