Directed Assembly of Lamellae Forming Block Copolymer Thin Films near the Order-Disorder Transition

Journal Article · Thu Aug 07 00:00:00 EDT 2014 · Nano Lett.

DOI:https://doi.org/10.1021/nl403628d· OSTI ID:1149628

Kim, Sangwon; Nealey, Paul F.; Bates, Frank S. ^[1]

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1. UC

The impact of thin film confinement on the ordering of lamellae was investigated using symmetric poly(styrene-b-[isoprene-ran-epoxyisoprene]) diblock copolymers bound by nonpreferential wetting interfaces. The order–disorder transition temperature (T_ODT) and the occurrence of composition fluctuations in the disordered state are not significantly affected by two-dimensional confinement. Directed self-assembly using chemical patterning is demonstrated near T_ODT. These results establish the minimum feature size attainable using directed self-assembly of a given diblock copolymer system.

• Research Organization: Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
• Sponsoring Organization: National Science Foundation (NSF)
• OSTI ID: 1149628
• Journal Information: Nano Lett., Vol. 14, Issue (1) ; 01, 2014
• Country of Publication: United States
• Language: ENGLISH