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Title: Long Range Chiral Imprinting of Cu(110) by Tartaric Acid

Journal Article · · JOURNAL OF PHYSICAL CHEMISTRY C
DOI:https://doi.org/10.1021/jp402015r· OSTI ID:1129865

Restructuring of metals by chiral molecules represents an important route to inducing and controlling enantioselective surface chemistry. Tartaric acid adsorption on Cu(110) has served as a useful system for understanding many aspects of chiral molecule adsorption and ordering on a metal surface, and a number of chiral and achiral unit cells have been reported. Herein, we show that given the appropriate annealing treatment, singly deprotonated tartaric acid monolayers can restructure the Cu metal itself, and that the resulting structure is both highly ordered and chiral. Molecular resolution scanning tunneling microscopy reveals that singly deprotonated tartaric acid extracts Cu atoms from the Cu(110) surface layer and incorporates them into highly ordered, chiral adatom arrays capped by a continuous molecular layer. Further evidence for surface restructuring comes from images of atom-deep trenches formed in the Cu(110) surface during the process. These trenches also run in low symmetry directions and are themselves chiral. Simulated scanning tunneling microscopy images are consistent with the appearance of the added atom rows and etched trenches. The chiral imprinting results in a long-range, highly ordered unit cell covering the whole surface as confirmed by low energy electron diffraction. Details of the restructuring mechanism were further investigated via time-lapse imaging at elevated temperature. This work reveals the stages of nanoscale surface restructuring and offers an interesting method for chiral modification of an achiral metal surface.

Research Organization:
National Energy Technology Lab. (NETL), Pittsburgh, PA, and Morgantown, WV (United States). In-house Research
Sponsoring Organization:
USDOE Office of Fossil Energy (FE)
DOE Contract Number:
DE-FE0004000
OSTI ID:
1129865
Report Number(s):
A-UNIV-PUB-063
Journal Information:
JOURNAL OF PHYSICAL CHEMISTRY C, Vol. 117, Issue 43
Country of Publication:
United States
Language:
English