9 T high magnetic field annealing effects on FeN bulk sample

Journal Article · Wed May 07 00:00:00 EDT 2014 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4868493· OSTI ID:1123589

Jiang, Yanfeng ^[1]; Dabade, Vivekanand ^[2]; Brady, Michael P. ^[3]; Rios, Orlando ^[3]; James, Richard D. ^[2]; Wang, Jian-Ping ^[1]

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1. Department of Electrical and Computer Engineering, University of Minnesota, Minneapolis, Minneota 55455, USA
2. Department of Aerospace Engineering and Mechanics, University of Minnesota, Minneapolis, Minnesota 55455, USA
3. Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831–6115, USA

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). High Temperature Materials Lab. (HTML); Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Manufacturing Demonstration Facility (MDF)
• Sponsoring Organization: USDOE
• DOE Contract Number: DE-AC05-00OR22725
• OSTI ID: 1123589
• Journal Information: Journal of Applied Physics, Vol. 115, Issue 17; ISSN 0021-8979
• Publisher: American Institute of Physics (AIP)
• Country of Publication: United States
• Language: English