Focused-Ion-Beam induced damage in thin films of complex oxide BiFeO3

Journal Article · Wed Jan 01 00:00:00 EST 2014 · APL Materials

DOI:https://doi.org/10.1063/1.4866051· OSTI ID:1123565

Siemons, Wolter ^[1]; Fowlkes, Jason Davidson ^[1]; Balke, Nina ^[1]; Tischler, Jonathan ^[2]; Xu, Ruqing ^[2]; Liu, W. ^[2]; Gonzales, C M ^[3]; Budai, John D ^[1]; Christen, Hans M ^[1]

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1. ORNL
2. Argonne National Laboratory (ANL)
3. The University of Tennessee

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
• Sponsoring Organization: USDOE Office of Science (SC)
• DOE Contract Number: DE-AC05-00OR22725
• OSTI ID: 1123565
• Journal Information: APL Materials, Vol. 2, Issue 2; ISSN 2166--532X
• Country of Publication: United States
• Language: English