Interfacial Design for Block Copolymer Thin Films
- LAM
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
- Sponsoring Organization:
- NSFOTHERUNIVERSITYINDUSTRY
- OSTI ID:
- 1121471
- Journal Information:
- Chemistry of Materials, Vol. 26, Issue (3) ; 02, 2014; ISSN 0897-4756
- Publisher:
- American Chemical Society (ACS)
- Country of Publication:
- United States
- Language:
- ENGLISH
Similar Records
Influence of Interfacial Energy on Electric-Field-Induced Sphere-to-Cylinder Transition in Block Copolymer Thin Films
Fabrication of Nanoporous Block Copolymer Thin Films through Mediation of Interfacial Interactions with UV Cross-Linked Polystyrene
Through-Thickness Vertically Ordered Lamellar Block Copolymer Thin Films on Unmodified Quartz with Cold Zone Annealing [Thru-Thickness Vertically Ordered Lamellar Block Copolymer Thin Films on Unmodified Quartz with Cold Zone Annealing]
Journal Article
·
Tue Jan 01 00:00:00 EST 2008
· Macromolecules
·
OSTI ID:1121471
Fabrication of Nanoporous Block Copolymer Thin Films through Mediation of Interfacial Interactions with UV Cross-Linked Polystyrene
Journal Article
·
Thu Jan 01 00:00:00 EST 2009
· Macromolecules
·
OSTI ID:1121471
+1 more
Through-Thickness Vertically Ordered Lamellar Block Copolymer Thin Films on Unmodified Quartz with Cold Zone Annealing [Thru-Thickness Vertically Ordered Lamellar Block Copolymer Thin Films on Unmodified Quartz with Cold Zone Annealing]
Journal Article
·
Tue Nov 14 00:00:00 EST 2017
· Nano Letters
·
OSTI ID:1121471
+3 more