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Title: Manufacturing method of photonic crystal

Patent ·
OSTI ID:1082693
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A manufacturing method of a photonic crystal is provided. In the method, a high-refractive-index material is conformally deposited on an exposed portion of a periodic template composed of a low-refractive-index material by an atomic layer deposition process so that a difference in refractive indices or dielectric constants between the template and adjacent air becomes greater, which makes it possible to form a three-dimensional photonic crystal having a superior photonic bandgap. Herein, the three-dimensional structure may be prepared by a layer-by-layer method.

Research Organization:
AMES (Ames Laboratory (AMES), Ames, IA (United States))
Sponsoring Organization:
USDOE
DOE Contract Number:
AC02-07CH11358
Assignee:
IUCF-HYU Industry-University Cooperation Foundation, Hanyang University (Seoul, KR) ; Iowa State University Research Foundation, Inc. (Ames, IA)
Patent Number(s):
8,361,545
Application Number:
12/227,594
OSTI ID:
1082693
Country of Publication:
United States
Language:
English

References (5)

Photonic crystals patent February 2006
Fabrication of photonic band gap materials using microtransfer molded templates patent April 2003
Optical films and methods of making the same patent March 2010
Method to fabricate layered material compositions patent November 2004
Periodic dielectric structure having a complete three-dimensional photonic band gap patent July 2003

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36 MATERIALS SCIENCE