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Title: Variation in band offsets at ZnO/Sn:In2O3 (ITO) heterojunctions measured by x-ray photoelectron spectroscopy

Journal Article · · Journal of Vacuum Science and Technology A--Vacuum, Surfaces and Films, 30(4): 04D112
DOI:https://doi.org/10.1116/1.4719541· OSTI ID:1048607

Rational design and optimization of efficient photovoltaics requires fundamental knowledge of both the materials properties of the individual components and the conduction and valence band alignments at the materials interfaces. Efficient collection of electrons photogenerated in the absorber material requires a small or zero conduction band offset at both the absorber/n-type semiconductor and the n-type semiconductor/electrode interfaces. Negative conduction band offsets result in an energy barrier to electron injection, while large positive conduction band offsets (a “cliff” arrangement) result in too much energy lost during injection. However, it is difficult to predict heterojunction band offsets from bulk materials properties. Experimental band alignments of semiconductor heterojunctions rarely conform to the Anderson model,1 which assumes the band alignments are determined solely by differences in the electron affinity of the two semiconductors. Chemical bonds at the heterojunction interface give rise to an interfacial dipole which influences the interfacial band alignment. Thus, the complex interplay between electron affinity differences, Fermi level matching, interface-induced gap states, and band bending determine heterojunction band alignments.2-5 Band alignments can also be modified by doping, point defects, or control of non-stoichiometry at the interface; since these parameters can be affected by processing conditions, they offer a mechanism to modify the band alignments of a given heterojunction system.

Research Organization:
Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC05-76RL01830
OSTI ID:
1048607
Report Number(s):
PNNL-SA-85891; TRN: US201216%%1040
Journal Information:
Journal of Vacuum Science and Technology A--Vacuum, Surfaces and Films, 30(4): 04D112, Vol. 30, Issue 4
Country of Publication:
United States
Language:
English