In situ x-ray investigation of freestanding nanoscale Cu-Nb multilayers under tensile load.

Journal Article · Thu Jan 01 00:00:00 EST 2009 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.3074374· OSTI ID:1038666

Aydiner, C C; Misra, A; Brown, D W; Mara, N A; Almer, J D ^[1]

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1. X-Ray Science Division

The yield behavior in a freestanding sputter-deposited Cu/Nb multilayer with 30 nm nominal individual layer thickness has been investigated with in situ synchrotron x-ray diffraction during tensile loading. A pronounced elastic-plastic transition is observed with the fraction of plastically yielded grains increasing gradually with strain. Near synchronous yielding is observed in the Cu and Nb grains. The gradual progression in yield behavior is interpreted in terms of residual stresses, and elastic and plastic anisotropy.

• Research Organization: Argonne National Lab. (ANL), Argonne, IL (United States)
• Sponsoring Organization: USDOE Office of Science (SC)
• DOE Contract Number: DE-AC02-06CH11357
• OSTI ID: 1038666
• Report Number(s): ANL/XSD/JA-66466; APPLAB; TRN: US201208%%752
• Journal Information: Applied Physics Letters, Vol. 94, Issue 3; ISSN 0003-6951
• Country of Publication: United States
• Language: ENGLISH

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ANISOTROPY
PLASTICS
RESIDUAL STRESSES
SYNCHROTRONS
THICKNESS
X-RAY DIFFRACTION