ALUMINUM IMPURITY DIFFUSION IN MAGNESIUM

Journal Article · Sun Jan 01 00:00:00 EST 2012 · Journal of Phase Equilibria and Diffusion

DOI:https://doi.org/10.1007/s11669-012-0007-2· OSTI ID:1038072

Brennan, Sarah ^[1]; Warren, Andrew ^[1]; Coffey, Kevin ^[1]; Kulkarni, Nagraj S ^[2]; Todd, Peter J ^[2]; Sohn, Yong Ho ^[1]; Klimov, Mikhail ^[1]

---

1. University of Central Florida
2. ORNL

The Al impurity diffusion in polycrystalline Mg (99.9%) via depth profiling with secondary ion mass spectrometry was studied in the temperature range of 673-573K, utilizing the thin film method and thin film solution to the diffusion equation. Multiple samples were utilized and multiple profiles were obtained to determine statistically confident coefficient with maximum standard deviation of 16%. Activation energy and pre-exponential factor of Al impurity diffusion in Mg was determined as 155 kJ/mole and 3.9 x 10-3 m2/sec.

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
• Sponsoring Organization: USDOE Office of Energy Efficiency and Renewable Energy (EERE)
• DOE Contract Number: DE-AC05-00OR22725
• OSTI ID: 1038072
• Journal Information: Journal of Phase Equilibria and Diffusion, Vol. 33, Issue 2; ISSN 1547-7037
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ACTIVATION ENERGY
ALUMINIUM
DIFFUSION
DIFFUSION EQUATIONS
MAGNESIUM
MASS SPECTROSCOPY
THIN FILMS
diffusion
aluminum
magnesium
secondary ion mass spectrometry
impurity