Titanium self-diffusion and chemical diffusion in Ti{sub 3}Al

Journal Article · Tue Aug 15 00:00:00 EDT 1995 · Scripta Metallurgica et Materialia

DOI:https://doi.org/10.1016/0956-716X(95)00237-P· OSTI ID:103568

Ruesing, J; Herzig, C ^[1]

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1. Universitaet Muenster (Germany). Institut fuer Metallforschung

Temperature and concentration dependence of the diffusion of Ti and Al has been measured in the ordered {alpha}{sub 2}-phase Ti{sub 3}Al. Ti self-diffusion is almost independent of the Al concentration in the hyperstoichiometric {alpha}{sub 2}-phase. The absolute D*{sub Ti}-values are rather low. Obviously diffusion proceeds by the vacancy mechanism and no constitutional vacancies but Al antisite defects are formed. Chemical diffusion {tilde D} is larger than self-diffusion D*{sub Ti} due to the fact that the thermodynamic factor {Phi} is larger than unity in the {alpha}{sub 2}-phase. Al self-diffusion D*{sub Al} was deduced to be lower than D*{sub Ti} by a factor of two to three in the range of 1,273 K to 1,173 K.

• OSTI ID: 103568
• Journal Information: Scripta Metallurgica et Materialia, Vol. 33, Issue 4; Other Information: PBD: 15 Aug 1995
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
TITANIUM ALLOYS
ATOM TRANSPORT
ALUMINIUM ALLOYS
TITANIUM
SELF-DIFFUSION
ALUMINIUM
INTERMETALLIC COMPOUNDS
SAMPLE PREPARATION
ELECTRON MICROPROBE ANALYSIS
TRACER TECHNIQUES
TITANIUM 44
TEMPERATURE DEPENDENCE
ABUNDANCE
GRAIN BOUNDARIES
VACANCIES