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Title: Metastable Phase Formation During the Reaction of Ni Films with Si(001): the Role of Texture Inheritance

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3327451· OSTI ID:1019776

The thermally induced solid-state reaction between a 10-nm-thick Ni film and a Si(001) substrate was investigated using in situ x-ray diffraction and ex situ pole figure analyses. The reaction begins with the appearance of orthorhombic Ni{sub 2}Si grains characterized by a strong fiber texture. The formation of the metastable hexagonal {theta} phase - which inherits the fiber texture of Ni{sub 2}Si - is then observed. This phase has been observed in every sample studied regardless of dopant, film thickness, deposition method, and anneal profile (>2000 conditions). Texture inheritance allows a reaction pathway with a lower activation energy than the expected formation through thermodynamically stable Ni silicide phases.

Research Organization:
Brookhaven National Lab. (BNL), Upton, NY (United States). National Synchrotron Light Source
Sponsoring Organization:
DOE - OFFICE OF SCIENCE
DOE Contract Number:
DE-AC02-98CH10886
OSTI ID:
1019776
Report Number(s):
BNL-95622-2011-JA; JAPIAU; TRN: US201115%%415
Journal Information:
Journal of Applied Physics, Vol. 107, Issue 9; ISSN 0021-8979
Country of Publication:
United States
Language:
English