Nanotransfer Printing Using Plasma Etched Silicon Stamps and Mediated by In-Situ Deposited Fluoropolyme

Journal Article · Sat Jan 01 00:00:00 EST 2011 · Journal of the American Chemical Society

DOI:https://doi.org/10.1021/ja201497a· OSTI ID:1016605

Bhandari, Deepak ^[1]; Kravchenko, Ivan I ^[1]; Lavrik, Nickolay V ^[1]; Sepaniak, Michael J ^[1]

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1. ORNL

This communication describes a simple method that uses a thin film of octafluorocyclobutane (OFCB) polymer for efficient nanoscale transfer printing (nTP). Plasma polymerization of OFCB produces a Teflon-like fluoropolymer which strongly adheres and conformally covers 3-D inorganic stamp. The inherently low surface energy of in-situ deposited OFCB polymer on nanoscale silicon features is demonstrated as a unique nanocomposite stamp to fabricate various test structures with improved nTP feature resolution down to sub 100 nm.

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
• Sponsoring Organization: USDOE Office of Science (SC)
• DOE Contract Number: DE-AC05-00OR22725
• OSTI ID: 1016605
• Journal Information: Journal of the American Chemical Society, Vol. 133, Issue 20; ISSN 0002--7863
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
COMMUNICATIONS
PLASMA
POLYMERIZATION
POLYMERS
RESOLUTION
SILICON
SURFACE ENERGY
THIN FILMS