Hydration and reduction of molecular beam epitaxy grown VO[subscript x]/a-Fe[subscript 2]O[subscript 3] (0001): Ambient pressure study
Abstract
Supported vanadium oxides processed under ambient environments have been studied by using X-ray standing wave (XSW) analysis of X-ray fluorescence spectroscopy and X-ray photoelectron spectroscopy (XPS). For the VO{sub x}/{alpha}-Fe{sub 2}O{sub 3}(0001) system, hydration and hydrogen annealing have been carried out under ambient pressure. Vanadium in the hydrated oxide phase occupies two high-symmetry surface adsorption sites with distinct adsorption heights, which resembles the adsorption geometry of fully oxidized vanadium. Reduction by the hydrogen annealing enhanced the V overlayer ordering by relocating a portion of the disordered V to high-symmetry sites. The V atoms located closer to the substrate oxygen layer in the hydrated phase moved toward the substrate after hydrogen reduction, while the V in the higher adsorption site stayed at the same height. The different responses of two adsorption sites to the reduction process are discussed and related to activities of the two sites.
- Authors:
- Publication Date:
- Research Org.:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1005465
- Resource Type:
- Journal Article
- Journal Name:
- J. Phys. Chem. C
- Additional Journal Information:
- Journal Volume: 113; Journal Issue: (4) ; 01, 2009; Journal ID: ISSN 1932-7447
- Country of Publication:
- United States
- Language:
- ENGLISH
- Subject:
- 08 HYDROGEN; 36 MATERIALS SCIENCE; ADSORPTION; ANNEALING; ATOMS; FLUORESCENCE SPECTROSCOPY; GEOMETRY; HYDRATION; HYDROGEN; MOLECULAR BEAM EPITAXY; OXIDES; OXYGEN; STANDING WAVES; SUBSTRATES; VANADIUM; VANADIUM OXIDES; X-RAY PHOTOELECTRON SPECTROSCOPY
Citation Formats
Kim, C -Y, Klug, J A, Stair, P C, Bedzyk, M J, and NWU). Hydration and reduction of molecular beam epitaxy grown VO[subscript x]/a-Fe[subscript 2]O[subscript 3] (0001): Ambient pressure study. United States: N. p., 2009.
Web. doi:10.1021/jp804133s.
Kim, C -Y, Klug, J A, Stair, P C, Bedzyk, M J, & NWU). Hydration and reduction of molecular beam epitaxy grown VO[subscript x]/a-Fe[subscript 2]O[subscript 3] (0001): Ambient pressure study. United States. https://doi.org/10.1021/jp804133s
Kim, C -Y, Klug, J A, Stair, P C, Bedzyk, M J, and NWU). 2009.
"Hydration and reduction of molecular beam epitaxy grown VO[subscript x]/a-Fe[subscript 2]O[subscript 3] (0001): Ambient pressure study". United States. https://doi.org/10.1021/jp804133s.
@article{osti_1005465,
title = {Hydration and reduction of molecular beam epitaxy grown VO[subscript x]/a-Fe[subscript 2]O[subscript 3] (0001): Ambient pressure study},
author = {Kim, C -Y and Klug, J A and Stair, P C and Bedzyk, M J and NWU)},
abstractNote = {Supported vanadium oxides processed under ambient environments have been studied by using X-ray standing wave (XSW) analysis of X-ray fluorescence spectroscopy and X-ray photoelectron spectroscopy (XPS). For the VO{sub x}/{alpha}-Fe{sub 2}O{sub 3}(0001) system, hydration and hydrogen annealing have been carried out under ambient pressure. Vanadium in the hydrated oxide phase occupies two high-symmetry surface adsorption sites with distinct adsorption heights, which resembles the adsorption geometry of fully oxidized vanadium. Reduction by the hydrogen annealing enhanced the V overlayer ordering by relocating a portion of the disordered V to high-symmetry sites. The V atoms located closer to the substrate oxygen layer in the hydrated phase moved toward the substrate after hydrogen reduction, while the V in the higher adsorption site stayed at the same height. The different responses of two adsorption sites to the reduction process are discussed and related to activities of the two sites.},
doi = {10.1021/jp804133s},
url = {https://www.osti.gov/biblio/1005465},
journal = {J. Phys. Chem. C},
issn = {1932-7447},
number = (4) ; 01, 2009,
volume = 113,
place = {United States},
year = {Tue Feb 10 00:00:00 EST 2009},
month = {Tue Feb 10 00:00:00 EST 2009}
}