Total reflection inelastic x-ray scattering from a 10 nm thick La{sub 0.6}Sr{sub 0.2}CoO{sub 3} thin film.
To study equilibrium changes in composition, valence, and electronic structure near the surface and into the bulk, we demonstrate the use of a new approach, total-reflection inelastic x-ray scattering, as a sub-keV spectroscopy capable of depth profiling chemical changes in thin films with nanometer resolution. By comparing data acquired under total x-ray reflection and penetrating conditions, we are able to separate the O K-edge spectra from a 10 nm La{sub 0.6}Sr{sub 0.4}CoO{sub 3} thin film from that of the underlying SrTiO{sub 3} substrate. With a smaller wavelength probe than comparable soft x-ray absorption measurements, we also describe the ability to easily access dipole-forbidden final states, using the dramatic evolution of the La N{sub 4,5} edge with momentum transfer as an example.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- DE-AC02-06CH11357
- OSTI ID:
- 1004054
- Report Number(s):
- ANL/MSD/JA-68939; TRN: US201103%%299
- Journal Information:
- Phys. Rev. Lett., Vol. 106, Issue Jan. 18, 2011
- Country of Publication:
- United States
- Language:
- ENGLISH
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