Nonequilibrium Interlayer Transport in Pulsed Laser Deposition

Journal Article · Sun Jan 01 00:00:00 EST 2006 · Physical Review Letters

DOI:https://doi.org/10.1103/PhysRevLett.96.226104· OSTI ID:1003582

Tischler, Jonathan Zachary ^[1]; Eres, Gyula ^[1]; Larson, Ben C ^[1]; Rouleau, Christopher M ^[1]; Zschack, P. ^[2]; Lowndes, Douglas H ^[1]

---

1. ORNL
2. University of Illinois, Urbana-Champaign

We use time-resolved surface x-ray diffraction measurements with microsecond range resolution to study the growth kinetics of pulsed laser deposited SrTiO3. Time-dependent surface coverages corresponding to single laser shots were determined directly from crystal truncation rod intensity transients. Analysis of surface coverage evolution shows that extremely fast nonequilibrium interlayer transport, which occurs concurrently with the arrival of the laser plume, dominates the deposition process. A much smaller fraction of material, which is governed by the dwell time between successive laser shots, is transferred by slow, thermally driven interlayer transport processes.

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
• Sponsoring Organization: USDOE Office of Science (SC)
• DOE Contract Number: DE-AC05-00OR22725
• OSTI ID: 1003582
• Journal Information: Physical Review Letters, Vol. 96, Issue 22; ISSN 0031--9007
• Country of Publication: United States
• Language: English