Large-Scale All-Dielectric Metamaterial Perfect Reflectors
Abstract
All-dielectric metamaterials offer a potential low-loss alternative to plasmonic metamaterials at optical frequencies. In this paper, we take advantage of the low absorption loss as well as the simple unit cell geometry to demonstrate large-scale (centimeter-sized) all-dielectric metamaterial perfect reflectors made from silicon cylinder resonators. These perfect reflectors, operating in the telecommunications band, were fabricated using self-assembly based nanosphere lithography. In spite of the disorder originating from the self-assembly process, the average reflectance of the metamaterial perfect reflectors is 99.7% at 1530 nm, surpassing the reflectance of metallic mirrors. Moreover, the spectral separation of the electric and magnetic resonances can be chosen to achieve the required reflection bandwidth while maintaining a high tolerance to disorder. Finally, the scalability of this design could lead to new avenues of manipulating light for low-loss and large-area photonic applications.
- Authors:
-
- Vanderbilt Univ., Nashville, TN (United States). Interdisciplinary Materials Science Program
- SRI International, Menlo Park, CA (United States). Applied Optics Lab.
- Vanderbilt Univ., Nashville, TN (United States). Dept. of Mechanical Engineering
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences
- Publication Date:
- Research Org.:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
- Sponsoring Org.:
- USDOE Office of Science (SC); US Department of the Navy, Office of Naval Research (ONR)
- Contributing Org.:
- Vanderbilt Univ., Nashville, TN (United States); SRI International, Menlo Park, CA (United States)
- OSTI Identifier:
- 1265550
- Grant/Contract Number:
- AC05-00OR22725; N00014-14-1-0475; N00014-12-1-0722
- Resource Type:
- Accepted Manuscript
- Journal Name:
- ACS Photonics
- Additional Journal Information:
- Journal Volume: 2; Journal Issue: 6; Journal ID: ISSN 2330-4022
- Publisher:
- American Chemical Society (ACS)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; all-dielectric metamaterial; Mie resonance; nanosphere lithography; perfect reflector
Citation Formats
Moitra, Parikshit, Slovick, Brian A., li, Wei, Kravchencko, Ivan I., Briggs, Dayrl P., Krishnamurthy, S., and Valentine, Jason. Large-Scale All-Dielectric Metamaterial Perfect Reflectors. United States: N. p., 2015.
Web. doi:10.1021/acsphotonics.5b00148.
Moitra, Parikshit, Slovick, Brian A., li, Wei, Kravchencko, Ivan I., Briggs, Dayrl P., Krishnamurthy, S., & Valentine, Jason. Large-Scale All-Dielectric Metamaterial Perfect Reflectors. United States. https://doi.org/10.1021/acsphotonics.5b00148
Moitra, Parikshit, Slovick, Brian A., li, Wei, Kravchencko, Ivan I., Briggs, Dayrl P., Krishnamurthy, S., and Valentine, Jason. Fri .
"Large-Scale All-Dielectric Metamaterial Perfect Reflectors". United States. https://doi.org/10.1021/acsphotonics.5b00148. https://www.osti.gov/servlets/purl/1265550.
@article{osti_1265550,
title = {Large-Scale All-Dielectric Metamaterial Perfect Reflectors},
author = {Moitra, Parikshit and Slovick, Brian A. and li, Wei and Kravchencko, Ivan I. and Briggs, Dayrl P. and Krishnamurthy, S. and Valentine, Jason},
abstractNote = {All-dielectric metamaterials offer a potential low-loss alternative to plasmonic metamaterials at optical frequencies. In this paper, we take advantage of the low absorption loss as well as the simple unit cell geometry to demonstrate large-scale (centimeter-sized) all-dielectric metamaterial perfect reflectors made from silicon cylinder resonators. These perfect reflectors, operating in the telecommunications band, were fabricated using self-assembly based nanosphere lithography. In spite of the disorder originating from the self-assembly process, the average reflectance of the metamaterial perfect reflectors is 99.7% at 1530 nm, surpassing the reflectance of metallic mirrors. Moreover, the spectral separation of the electric and magnetic resonances can be chosen to achieve the required reflection bandwidth while maintaining a high tolerance to disorder. Finally, the scalability of this design could lead to new avenues of manipulating light for low-loss and large-area photonic applications.},
doi = {10.1021/acsphotonics.5b00148},
journal = {ACS Photonics},
number = 6,
volume = 2,
place = {United States},
year = {Fri May 08 00:00:00 EDT 2015},
month = {Fri May 08 00:00:00 EDT 2015}
}
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