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Title: Near unity ideality factor and Shockley-Read-Hall lifetime in GaN-on-GaN p-n diodes with avalanche breakdown

Abstract

Textbook-like device characteristics are demonstrated in vertical GaN p-n diodes grown on bulk GaN substrates. These devices show simultaneously an avalanche breakdown voltage (BV) of >1.4 kV under reverse bias, an ideality factor plateau of ∼2.0 in a forward bias window followed by a near unity ideality factor of 1.1, which are consistently achieved over a temperature range of 300–400 K. At room temperature (RT), the diode with a mesa diameter of 107 μm showed a differential on-resistance Ron of 0.12 mΩcm2, thus resulting in a record figure-of-merit BV2/Ron of ∼16.5 GW/cm2, which is the highest ever demonstrated in any semiconductors. Analytical models are used to fit experimental I-Vs; based on the recombination current with an ideality factor of ∼2.0, a Shockley-Read-Hall lifetime of 12 ns is extracted at RT with an estimated recombination center concentration of 3 × 1015 cm−3.

Authors:
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Publication Date:
Sponsoring Org.:
USDOE Advanced Research Projects Agency - Energy (ARPA-E)
OSTI Identifier:
1420569
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Name: Applied Physics Letters Journal Volume: 107 Journal Issue: 24; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Hu, Zongyang, Nomoto, Kazuki, Song, Bo, Zhu, Mingda, Qi, Meng, Pan, Ming, Gao, Xiang, Protasenko, Vladimir, Jena, Debdeep, and Xing, Huili Grace. Near unity ideality factor and Shockley-Read-Hall lifetime in GaN-on-GaN p-n diodes with avalanche breakdown. United States: N. p., 2015. Web. doi:10.1063/1.4937436.
Hu, Zongyang, Nomoto, Kazuki, Song, Bo, Zhu, Mingda, Qi, Meng, Pan, Ming, Gao, Xiang, Protasenko, Vladimir, Jena, Debdeep, & Xing, Huili Grace. Near unity ideality factor and Shockley-Read-Hall lifetime in GaN-on-GaN p-n diodes with avalanche breakdown. United States. https://doi.org/10.1063/1.4937436
Hu, Zongyang, Nomoto, Kazuki, Song, Bo, Zhu, Mingda, Qi, Meng, Pan, Ming, Gao, Xiang, Protasenko, Vladimir, Jena, Debdeep, and Xing, Huili Grace. Tue . "Near unity ideality factor and Shockley-Read-Hall lifetime in GaN-on-GaN p-n diodes with avalanche breakdown". United States. https://doi.org/10.1063/1.4937436.
@article{osti_1420569,
title = {Near unity ideality factor and Shockley-Read-Hall lifetime in GaN-on-GaN p-n diodes with avalanche breakdown},
author = {Hu, Zongyang and Nomoto, Kazuki and Song, Bo and Zhu, Mingda and Qi, Meng and Pan, Ming and Gao, Xiang and Protasenko, Vladimir and Jena, Debdeep and Xing, Huili Grace},
abstractNote = {Textbook-like device characteristics are demonstrated in vertical GaN p-n diodes grown on bulk GaN substrates. These devices show simultaneously an avalanche breakdown voltage (BV) of >1.4 kV under reverse bias, an ideality factor plateau of ∼2.0 in a forward bias window followed by a near unity ideality factor of 1.1, which are consistently achieved over a temperature range of 300–400 K. At room temperature (RT), the diode with a mesa diameter of 107 μm showed a differential on-resistance Ron of 0.12 mΩcm2, thus resulting in a record figure-of-merit BV2/Ron of ∼16.5 GW/cm2, which is the highest ever demonstrated in any semiconductors. Analytical models are used to fit experimental I-Vs; based on the recombination current with an ideality factor of ∼2.0, a Shockley-Read-Hall lifetime of 12 ns is extracted at RT with an estimated recombination center concentration of 3 × 1015 cm−3.},
doi = {10.1063/1.4937436},
journal = {Applied Physics Letters},
number = 24,
volume = 107,
place = {United States},
year = {Tue Dec 15 00:00:00 EST 2015},
month = {Tue Dec 15 00:00:00 EST 2015}
}

Journal Article:
Free Publicly Available Full Text
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https://doi.org/10.1063/1.4937436

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Works referenced in this record:

1.9-kV AlGaN/GaN Lateral Schottky Barrier Diodes on Silicon
journal, April 2015


p-n junctions on Ga-face GaN grown by NH3 molecular beam epitaxy with low ideality factors and low reverse currents
journal, November 2010

  • Hurni, Christophe A.; Bierwagen, Oliver; Lang, Jordan R.
  • Applied Physics Letters, Vol. 97, Issue 22
  • DOI: 10.1063/1.3521388

The rate of radiative recombination in the nitride semiconductors and alloys
journal, September 1999

  • Dmitriev, Alexey; Oruzheinikov, Alexander
  • Journal of Applied Physics, Vol. 86, Issue 6
  • DOI: 10.1063/1.371196

High Voltage Vertical GaN p-n Diodes With Avalanche Capability
journal, October 2013

  • Kizilyalli, Isik C.; Edwards, Andrew P.; Nie, Hui
  • IEEE Transactions on Electron Devices, Vol. 60, Issue 10
  • DOI: 10.1109/TED.2013.2266664

High Breakdown Voltage AlGaN–GaN HEMTs Achieved by Multiple Field Plates
journal, April 2004


Photon-recycling GaN p-n diodes demonstrating temperature-independent, extremely low on-resistance
conference, December 2011

  • Mochizuki, K.; Nomoto, K.; Hatakeyama, Y.
  • 2011 IEEE International Electron Devices Meeting (IEDM), 2011 International Electron Devices Meeting
  • DOI: 10.1109/IEDM.2011.6131617

Analysis of deep levels in n ‐type GaN by transient capacitance methods
journal, July 1994

  • Hacke, P.; Detchprohm, T.; Hiramatsu, K.
  • Journal of Applied Physics, Vol. 76, Issue 1
  • DOI: 10.1063/1.357144

Vertical Power p-n Diodes Based on Bulk GaN
journal, February 2015

  • Kizilyalli, Isik C.; Edwards, Andrew P.; Aktas, Ozgur
  • IEEE Transactions on Electron Devices, Vol. 62, Issue 2
  • DOI: 10.1109/TED.2014.2360861

Minority carrier recombination in heavily-doped silicon
journal, June 1983


Performance limiting surface defects in SiC epitaxial p-n junction diodes
journal, March 1999

  • Kimoto, T.; Miyamoto, N.; Matsunami, H.
  • IEEE Transactions on Electron Devices, Vol. 46, Issue 3
  • DOI: 10.1109/16.748864

Experimental analysis and theoretical model for anomalously high ideality factors (n≫2.0) in AlGaN/GaN p-n junction diodes
journal, August 2003

  • Shah, Jay M.; Li, Y. -L.; Gessmann, Th.
  • Journal of Applied Physics, Vol. 94, Issue 4
  • DOI: 10.1063/1.1593218

Minority carrier diffusion length in GaN: Dislocation density and doping concentration dependence
journal, January 2005

  • Kumakura, K.; Makimoto, T.; Kobayashi, N.
  • Applied Physics Letters, Vol. 86, Issue 5
  • DOI: 10.1063/1.1861116

A model for the field and temperature dependence of Shockley-Read-Hall lifetimes in silicon
journal, November 1992


Carrier Generation and Recombination in P-N Junctions and P-N Junction Characteristics
journal, September 1957


Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures
journal, March 1999

  • Ambacher, O.; Smart, J.; Shealy, J. R.
  • Journal of Applied Physics, Vol. 85, Issue 6
  • DOI: 10.1063/1.369664