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Title: Using Atom-Probe Tomography to Understand Zn O : Al / Si O 2 / Si Schottky Diodes

Abstract

In this work, we use electronic transport and atom-probe tomography to study ZnO:Al=SiO2=Si Schottky diodes on lightly doped n- and p-type Si. We vary the carrier concentration in the ZnO:Al films by 2 orders of magnitude, but the Schottky barrier height remains nearly constant. Atom-probe tomography shows that Al segregates to the interface, so that the ZnO:Al at the junction is likely to be metallic even when the bulk of the ZnO:Al film is semiconducting. We hypothesize that the observed Fermi-level pinning is connected to the insulator-metal transition in doped ZnO. In conclusion, this implies that tuning the band alignment at oxide/Si interfaces may be achieved by controlling the transition between localized and extended states in the oxide, thereby changing the orbital hybridization across the interface.

Authors:
 [1];  [1];  [1];  [2];  [3];  [1]
  1. Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
  2. Harvard Univ., Cambridge, MA (United States)
  3. Harvard Univ., Cambridge, MA (United States); Purdue Univ., West Lafayette, IN (United States)
Publication Date:
Research Org.:
Stanford Univ., CA (United States)
Sponsoring Org.:
USDOE Office of Energy Efficiency and Renewable Energy (EERE), Renewable Power Office. Solar Energy Technologies Office
OSTI Identifier:
1579857
Alternate Identifier(s):
OSTI ID: 1326861
Grant/Contract Number:  
EE0004946
Resource Type:
Accepted Manuscript
Journal Name:
Physical Review Applied
Additional Journal Information:
Journal Volume: 6; Journal Issue: 3; Journal ID: ISSN 2331-7019
Publisher:
American Physical Society (APS)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Jaramillo, R., Youssef, Amanda, Akey, Austin, Schoofs, Frank, Ramanathan, Shriram, and Buonassisi, Tonio. Using Atom-Probe Tomography to Understand ZnO:Al/SiO2/Si Schottky Diodes. United States: N. p., 2016. Web. doi:10.1103/PhysRevApplied.6.034016.
Jaramillo, R., Youssef, Amanda, Akey, Austin, Schoofs, Frank, Ramanathan, Shriram, & Buonassisi, Tonio. Using Atom-Probe Tomography to Understand ZnO:Al/SiO2/Si Schottky Diodes. United States. https://doi.org/10.1103/PhysRevApplied.6.034016
Jaramillo, R., Youssef, Amanda, Akey, Austin, Schoofs, Frank, Ramanathan, Shriram, and Buonassisi, Tonio. Mon . "Using Atom-Probe Tomography to Understand ZnO:Al/SiO2/Si Schottky Diodes". United States. https://doi.org/10.1103/PhysRevApplied.6.034016. https://www.osti.gov/servlets/purl/1579857.
@article{osti_1579857,
title = {Using Atom-Probe Tomography to Understand ZnO:Al/SiO2/Si Schottky Diodes},
author = {Jaramillo, R. and Youssef, Amanda and Akey, Austin and Schoofs, Frank and Ramanathan, Shriram and Buonassisi, Tonio},
abstractNote = {In this work, we use electronic transport and atom-probe tomography to study ZnO:Al=SiO2=Si Schottky diodes on lightly doped n- and p-type Si. We vary the carrier concentration in the ZnO:Al films by 2 orders of magnitude, but the Schottky barrier height remains nearly constant. Atom-probe tomography shows that Al segregates to the interface, so that the ZnO:Al at the junction is likely to be metallic even when the bulk of the ZnO:Al film is semiconducting. We hypothesize that the observed Fermi-level pinning is connected to the insulator-metal transition in doped ZnO. In conclusion, this implies that tuning the band alignment at oxide/Si interfaces may be achieved by controlling the transition between localized and extended states in the oxide, thereby changing the orbital hybridization across the interface.},
doi = {10.1103/PhysRevApplied.6.034016},
journal = {Physical Review Applied},
number = 3,
volume = 6,
place = {United States},
year = {Mon Sep 26 00:00:00 EDT 2016},
month = {Mon Sep 26 00:00:00 EDT 2016}
}

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Cited by: 6 works
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